Prefurnace Clean Sink (PFC Sink) - Login | Nanolab, UCLA

wafers in the HF tank. Always finish the dump rinse step and ensure that the
wafers are at room temperature. Set the wafer carrier with handle into the HF
solution for the desired time. Turn on the cascade rinser and nitrogen bubbler for
the rinsing step.(See Figure 8). When finished, turnoff both cascade bubble and
water, then dry the wafers as discussed in 6.3 below.
NOTE: HF is a separate training; only trained users can use HF bath.
Figure 8
HF or BOE
Rinse Bath
Cascade Bubble and Water
Rinse Controller