Prefurnace Clean Sink (PFC Sink) - Login | Nanolab, UCLA

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Figure 5 1. RCA Process Bath 1: DI Water (H2O) : Ammonium Hydroxide (NH4OH) : Hydrogen Peroxide (H2O2) 5:1:1 ratio. a. 6000 ml DI Water b. 1200 ml Ammonium Hydroxide c. 1200 ml Hydrogen Peroxide (Refresh solution with 250 ml H2O2, each usage) d. Heat the solution to 90 o C. The solution should begin to bubble vigorously as it approaches 90 o C. If not, wait a little longer and/or add more hydrogen peroxide. If the solution does not bubble, there is a problem contact Nanolab management. 2. RCA Process Bath 2: DI Water (H2O) : Hydrochloric Acid (HCl) : Hydrogen Peroxide (H2O2) 5:1:1 ratio. a. 5000 ml DI Water Dump Rinsers b. 1000 ml Hydrochloric Acid Bath 2 HCl Only Bath 1 Piranha or NH4OH c. 1000 ml Hydrogen Peroxide (Refresh solution with 250 ml H2O2, each usage) d. Heat the solution to 85 o C. The solution should begin to bubble vigorously as it
approaches 85 o C. If not, wait a little longer and/or add more hydrogen peroxide. If the solution does not bubble, there is a problem contact Nanolab management. 3. Piranha Process Bath 1: Sulfuric Acid (98%) (H2SO4) : Hydrogen Peroxide (H2O2) 17:1 ratio. 6.0 PROCEDURE 6.1 Sample Loading a. (2 bottles @ 15 lb. each) Sulfuric Acid (~7400ml) b. 425 ml Hydrogen Peroxide (Refresh solution with 250 ml H2O2, each usage) c. Heat the solution to 100 o C. The solution should begin to bubble vigorously as it approaches 100 o C. If not, wait a little longer and/or add more hydrogen peroxide. If the solution does not bubble, there is a problem contact Nanolab management. 1. Place wafers in white Teflon cassette and secure the Teflon handle to the cassette. NOTE: For a polysilicon run, include a silicon wafer with 1000 Å of oxide to be used as a thickness monitor on the Nanospec. Record the monitor number in the polysilicon logbook. 6.2 Wafer cleaning and rinsing 1. Piranha (or RCA 1) Cleaning Procedure: a. Turn on Power buttons for constant temperature baths 1 & 2. Press Hold to turn off the HOLD LED to begin the heating sequence. b. Verify that the solution in chemical bath 1 is Piranha solution. This is verified by looking for the recent bath entry in the log book. c. If the bath is different than Piranha, please contact Nanolab Staff. Note 1: If you replace or change the type of chemical bath solution, remember to fill in the logbook. Note 2: To make more Piranha solution chemical for Bath 1: pour 2 new sulfuric acid bottles (15 pounds each) into the empty Bath 1 quartz pot. Using a graduated cylinder or a clean beaker, measure 425ml of H2O2 (hydrogen peroxide). Allow solution to come to temperature (100 o C) prior to inserting wafers. We use a 17:1 ratio for our Piranha solution. : Note 3: To make more RCA Step 1 chemical for the bath: using graduated cylinder or a clean beaker, measure 6000ml of DI water; 1200ml of NH4OH (ammonium hydroxide); and 1200ml of H2O2 (hydrogen peroxide). Allow solution to come to temperature prior to inserting wafers. We use a 5:1:1 ratio.
Page 1 and 2: Superusers: Prefurnace Clean Sink (
Page 3 and 4: Materials: Fig 2 1. Dedicated const
Page 5: 5.2 Chemical Bath Replacement (STAF
Page 9 and 10: Figure 7 Hot Pot Lid Chemical Bath
Page 11: Fill out logbook: Enter run number,

Prefurnace Clean Sink (PFC Sink) - Login | Nanolab, UCLA

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