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Gate<br />
Channel<br />
Source Drain<br />
Implantation & Diffusion<br />
• Dopants inserted by ion implantation<br />
⇒ damage<br />
• Damage healed by annealing<br />
• During annealing, dopants diffuse fast<br />
(assisted by defects)<br />
⇒ important to optimize anneal<br />
*Hoechbauer, Nastasi, Windl<br />
Computational Materials Science and Engineering<br />
*