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Thermal properties in mesoscopics: physics and ... - ResearchGate

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(a)<br />

(b)<br />

T m<strong>in</strong> / T 0<br />

1.05<br />

1.00<br />

0.95<br />

0.90<br />

thermometer<br />

SINIS junctions<br />

Electron temperature at cool<strong>in</strong>g junctions<br />

Electron temperature on the membrane<br />

Lattice temperature on the membrane<br />

200 300 400 500 600<br />

T 0 (mK)<br />

SINIS junctions<br />

cold f<strong>in</strong>gers<br />

(d)<br />

(c)<br />

SIN junctions<br />

cold f<strong>in</strong>ger<br />

FIG. 32 (Color <strong>in</strong> onl<strong>in</strong>e edition) (a) SEM image of a Si3N4<br />

membrane (<strong>in</strong> the center) with self-suspended bridges. Two<br />

normal-metal cold f<strong>in</strong>gers extend<strong>in</strong>g onto the membrane are<br />

used to cool down the dielectric platform. The Al/Al2O3/Cu<br />

SINIS coolers are on the bulk (far down <strong>and</strong> top) <strong>and</strong> the<br />

thermometer st<strong>and</strong>s <strong>in</strong> the middle of the membrane. (b) Maximum<br />

temperature decrease (Tm<strong>in</strong>/T0) versus bath temperature<br />

T0 measured at different positions <strong>in</strong> the cooler shown <strong>in</strong><br />

(a). (c) Maximum lattice temperature decrease on the membrane<br />

versus bath temperature measured <strong>in</strong> two other samples<br />

similar to that shown <strong>in</strong> (a). In this case, the refrigerators exploited<br />

many small-area junctions arranged <strong>in</strong> parallel <strong>in</strong> a<br />

comb-like configuration. (d) SEM micrograph of a NIS refrigerator<br />

device with a neutron transmutation doped (NTD) Ge<br />

resistance thermometer attached on top of it. (c) is adapted<br />

from (Luukanen et al., 2000), (d) from (Clark et al., 2005).<br />

accord<strong>in</strong>g to<br />

˙QSINIS(V ; Te,N , Te,S) + ˙ Qph−sub(Tph, Tsub) = 0, (81)<br />

where Te,N Tph, Te,S Tsub, Tph is the lattice temperature<br />

<strong>in</strong> the dielectric membrane, Tsub is the lattice<br />

temperature <strong>in</strong> the substrate, <strong>and</strong> ˙ Qph−sub is the rate<br />

of exchanged energy between the membrane phonons<br />

<strong>and</strong> substrate phonons. Eventually, if additional devices<br />

are st<strong>and</strong><strong>in</strong>g on the same dielectric platform (for<br />

<strong>in</strong>stance, detectors, etc.), the latter will cool down first<br />

the phonons of the device <strong>and</strong> then its electrons through<br />

the electron-phonon <strong>in</strong>teraction.<br />

Dielectric membranes made of silicon nitride (Si3N4)<br />

have proved to be attractive for this purpose <strong>in</strong> light of<br />

their superior thermal isolation <strong>properties</strong> at low temperatures.<br />

Low-temperature heat transport characterization<br />

as well as thermal relaxation <strong>in</strong> low-stress Si3N4 membranes<br />

<strong>and</strong> films were quite recently addressed (Holmes<br />

et al., 1998; Leivo <strong>and</strong> Pekola, 1998). The first demonstration<br />

reported of lattice cool<strong>in</strong>g (Mann<strong>in</strong>en et al.,<br />

1997) exploited such membranes <strong>in</strong> comb<strong>in</strong>ation with<br />

Al/Al2O3/Cu SINIS refrigerators. In this experiment the<br />

authors were able to achieve a 2% temperature decrease<br />

<strong>in</strong> the membrane at bath temperatures T0 ≈ 200 mK.<br />

41<br />

Figure 32(a) shows a SEM image of a typical newgeneration<br />

lattice cooler fabricated on a Si3N4 membrane<br />

with self-suspended bridges. The membrane consists of<br />

a low-stress Si3N4 film deposited by low pressure chemical<br />

vapor deposition (LPCVD) on Si, <strong>and</strong> subsequently<br />

etched (with both wet <strong>and</strong> dry etch<strong>in</strong>g) <strong>in</strong> order to create<br />

the suspended bridge structure. In such th<strong>in</strong> membranes<br />

phonon propagation is essentially two-dimensional. The<br />

condensation of the phonon gas <strong>in</strong>to lower dimensions<br />

<strong>in</strong> ultrath<strong>in</strong> membranes was also theoretically discussed<br />

(Anghel <strong>and</strong> Mann<strong>in</strong>en, 1999; Anghel et al., 1998; Kuhn<br />

et al., 2004). The self-suspended bridges improve thermal<br />

isolation of the dielectric platform from the heat<br />

bath (Leivo <strong>and</strong> Pekola, 1998). The image also shows<br />

the Al/Al2O3/Cu refrigerators of the SINIS type that<br />

are placed on the bulk substrate (i.e., outside the membrane)<br />

to ensure good thermal contact with the bath.<br />

The N cold f<strong>in</strong>gers extend onto the silicon nitride membrane,<br />

whose temperature is determ<strong>in</strong>ed through an additional<br />

SINIS thermometer placed <strong>in</strong> the middle of the<br />

structure.<br />

The lattice refrigeration effect achieved <strong>in</strong> this SINIS<br />

refrigerator is shown <strong>in</strong> Fig. 32(b). Here the maximum<br />

temperature decrease of the membrane (Tm<strong>in</strong>/T0) aga<strong>in</strong>st<br />

bath temperature T0 is displayed (red circles), <strong>and</strong> shows<br />

that temperature reduction as high as about 12% was<br />

reached <strong>in</strong> the 400...500 mK range. The electron refrigeration<br />

effect <strong>in</strong> the Cu region was also measured at two<br />

different positions <strong>in</strong> the device, i.e., nearby the cool<strong>in</strong>g<br />

junctions <strong>and</strong> on the membrane. Notably, the Tm<strong>in</strong>/T0<br />

behavior is almost the same for the different sets of data;<br />

this basically means that: a) good thermalization was<br />

achieved <strong>in</strong> the cold f<strong>in</strong>gers; b) the electron-phonon coupl<strong>in</strong>g<br />

was sufficiently large while Kapitza resistance between<br />

Cu <strong>and</strong> Si3N4 was sufficiently small to ensure the<br />

lattice temperature on the membrane to be nearly equal<br />

to the Cu electron temperature on the membrane itself.<br />

The best results of lattice refrigeration by SINIS coolers<br />

reported to date are shown <strong>in</strong> Fig. 32(c) (Luukanen<br />

et al., 2000) for two other devices (labeled C <strong>and</strong> D <strong>in</strong> the<br />

figure) similar to that of Fig. 32(a). These devices exploited<br />

three Cu cold f<strong>in</strong>gers <strong>and</strong> several small-area junctions<br />

arranged <strong>in</strong> parallel <strong>in</strong> a comb-like configuration for<br />

the SINIS cool<strong>in</strong>g stage. The junction specific resistances<br />

were Rc = 1.39 kΩµm 2 <strong>and</strong> Rc = 220 Ωµm 2 for device<br />

C <strong>and</strong> D, respectively. Lattice temperature reduction as<br />

high as 50% at 200 mK was achieved <strong>in</strong> the sample with<br />

lower Rc, thus confirm<strong>in</strong>g the effectiveness of small-area<br />

junctions <strong>in</strong> yield<strong>in</strong>g larger temperature reductions. The<br />

achieved cool<strong>in</strong>g power <strong>in</strong> these devices was estimated<br />

on the pW level. The reduction of the refrigeration effect<br />

at the lowest temperatures can be expla<strong>in</strong>ed <strong>in</strong> terms<br />

of larger decoupl<strong>in</strong>g of electrons <strong>and</strong> phonons, but also<br />

the effects discussed <strong>in</strong> Sec. V.C.1 should play a role.<br />

Figure 32 (d) demonstrates the realization of a complete<br />

refrigerator device <strong>in</strong>clud<strong>in</strong>g a thermometer (Clark<br />

et al., 2005), where four pairs of NIS junctions are used<br />

to cool down a 450 × 450 µm 2 suspended Si3N4 dielectric

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