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Y. M. Galperin, 2004, Phys. Rev. B 70, 125425.
Kulik, I. O., and A. N. Omel’yanchuk, 1978, Sov. J. Low
Temp. Phys. 4, 142.
Kutchinsky, J., R. Taboryski, T. Clausen, C. B. Sorensen,
A. Kristensen, P. E. Lindelof, J. Bindslev Hansen,
C. Schelde Jacobsen, and J. L. Skov, 1997, Phys. Rev. Lett.
78, 931.
Kutchinsky, J., R. Taboryski, C. B. Sorensen, J. Bindslev
Hansen, and P. E. Lindelof, 1999, Phys. Rev. Lett.
83, 4856.
Kuzmin, L., 2004, in Astronomical Structures and Mechanisms
Technology, edited by J. Antebi and D. Lemke
(SPIE), volume 5498, pp. 349–361.
Kyser, D. F., 1983, J. Vac. Sci. Technol. B 1, 1391.
Kyser, D. F., and N. S. Viswanathan, 1975, J. Vac. Sci. Technol.
12, 1305.
Lamarre, J.-M., J. L. Puget, M. Piat, P. A. R. Ade, A. E.
Lange, A. Benoit, P. De Bernardis, F. R. Bouchet, J. J.
Bock, F. X. Desert, R. J. Emery, M. Giard, et al., 2003,
in IR Space Telescopes and Instruments, edited by J. C.
Mather (SPIE), volume 4850, pp. 730–739.
Lambe, J., and R. C. Jaklevic, 1969, Phys.Rev.Lett. 22, 1371.
Lambert, C. J., and R. Raimondi, 1998, J. Phys.: Condens.
Matter 10, 901.
Landauer, R., 1957, IBM J. Res. 1, 223.
Lanting, T. M., H.-M. Cho, J. Clarke, W. L. Holzapfel, A. T.
Lee, M. Lueker, and P. L. Richards, 2005, Appl. Phys. Lett.
86, 112511.
Lau, J. C., and R. V. Coleman, 1981, Phys. Rev. B 24, 2985.
Leivo, M. M., A. J. Manninen, and J. P. Pekola, 1997, Appl.
Supercond. 7-12, 227.
Leivo, M. M., and J. P. Pekola, 1998, Applied Physics Letters
72, 1305.
Leivo, M. M., J. P. Pekola, and D. V. Averin, 1996, Appl.
Phys. Lett. 68, 1996.
Leoni, R., G. Arena, M. G. Castellano, and G. Torrioli, 1999,
J. Appl. Phys. 85, 3877.
Leoni, R., B. Buonomo, M. G. Castellano, F. Mattioli,
D. Simeone, G. Torrioli, and P. Carelli, 2003, J. Appl. Phys.
93, 3572.
Levinson, H. J., and W. H. Arnold, 1997, in Handbook of
Microlithography, Micromachining, and Microfabrication,
edited by P. Rai-Choudhury (SPIE Optical Engineering
Press, Bellingham), volume 1, p. 11.
Likharev, K. K., 1979, Rev. Mod. Phys. 51, 101.
Lindell, A., J. Mattila, P. Deo, M. Manninen, and J. Pekola,
2000, Physica B 284-288, 1884.
van der Linden, P. J. E. M., and K. Behnia, 2004, Rev. Sci.
Instrum. 75, 273.
Little, W. A., 1984, Rev. Sci. Instrum. 55, 661.
Liu, Y., Z. Zhang, J. Wang, P. P. Freitas, and J. L. Martins,
2003, J. Appl. Phys. 93, 8385.
Lounasmaa, O. V., 1974, Experimental Principles and Methods
Below 1 K (Academic Press, London).
Lusher, C. P., J. Li, V. A. Maidanov, M. E. Digby, H. Dyball,
A. Casey, J. Nyeki, V. V. Dmitriev, B. P. Cowan, and
J. Saunders, 2001, Meas. Sci. Technol. 12, 1.
Lüth, H., 2001, Solid Surfaces, Interfaces, and Thin Films
(Springer, Berlin).
Luukanen, A., K. M. Kinnunen, A. K. Nuottajarvi, H. F. C.
Hoevers, W. M. B. Tiest, and J. P. Pekola, 2003, Phys.
Rev. Lett. 90, 238306.
Luukanen, A., M. M. Leivo, J. K. Suoknuuti, A. J. Manninen,
and J. P. Pekola, 2000, J. Low Temp. Phys. 120, 281.
55
Luukanen, A., A. Miller, and E. Grossman, 2005, in Passive
Millimeter-Wave Imaging Technology VIII, edited by
R. Appleby and D. A. Wikner (SPIE), volume 5789, in
press.
Luukanen, A., and J. P. Pekola, 2003, Appl. Phys. Lett. 82,
3970.
Madou, M., 1997, Fundamentals of Microfabrication (CRC
Press, Boca Raton).
Magnée, P. H. C., N. van der Post, P. H. M. Kooistra, B. J.
van Wees, and T. M. Klapwijk, 1994, Phys. Rev. B 50,
4594.
Mahan, G. D., 1994, J. Appl. Phys. 76, 4362.
Mahan, G. D., and L. M. Woods, 1998, Phys. Rev. Lett. 80,
4016.
Maissel, L. I., and R. Glang, 1970, Handbook of Thin Film
Technology (McGraw-Hill, New York).
Mal’shukov, A. G., and K. A. Chao, 2001, Phys. Rev. Lett.
86, 5570.
Manninen, A. J., M. M. Leivo, and J. P. Pekola, 1997, Applied
Physics Letters 70, 1885.
Manninen, A. J., J. K. Suoknuuti, M. M. Leivo, and J. P.
Pekola, 1999, Appl. Phys. Lett. 74, 3020.
Marinelli, C., L. Sorba, M. Lazzarino, D. Kumar, E. Pelucchi,
B. H. Müller, D. Orani, S. Rubini, A. Franciosi,
S. De Franceschi, and F. Beltram, 2000, J. Vac. Sci. Technol.
B 18, 2119.
Marnieros, S., L. Berge, A. Juillard, and L. Dumoulin, 1999,
Physica B 259-261, 862.
Marnieros, S., L. Berge, A. Juillard, and L. Dumoulin, 2000,
Phys. Rev. Lett. 84, 2469.
Mather, J. C., 1982, Appl. Opt. 21, 1125.
Matsuda, K., A. Kamijo, T. Mitsuzuka, and H. Tsuge, 1999,
J. Appl. Phys. 85, 5261.
Mauskopf, P. D., J. J. Bock, H. D. Castillo, W. L. Holzapfel,
and A. E. Lange, 1997, Appl. Opt. 36, 765.
Mazin, I. I., 1999, Phys. Rev. Lett. 83, 1427.
Mazin, I. I., 2000, Appl. Phys. Lett. 77, 3000.
McCord, M. A., and M. J. Rooks, 1997, in Handbook of
Microlithography, Micromachining, and Microfabrication,
edited by P. Rai-Choudhury (SPIE Optical Engineering
Press, Bellingham), volume 1, p. 139.
Mees, J., M. Nahum, and P. L. Richards, 1991, Appl. Phys.
Lett. 59, 2329.
Melton, R. G., J. L. Paterson, and S. B. Kaplan, 1981, Phys.
Rev. B 21, 1858.
Meschke, M., J. Pekola, and H. Godfrin, 2005, submitted .
Meschke, M., J. P. Pekola, F. Gay, R. E. Rapp, and H. Godfrin,
2004, J. Low Temp. Phys. 134, 1119.
Miller, A., S. Nam, J. Martinis, and A. Sergienko, 2003, Appl.
Phys. Lett. 83, 791.
Millman, J., and A. Grabel, 1987, Microelectronics,
(McGraw-Hill International Editions, New York), second
edition.
Min, G., and D. M. Rowe, 2000, Appl. Phys. Lett. 77, 860.
Miner, A., A. Majumdar, and U. Ghoshal, 1999, Appl. Phys.
Lett. 75, 1176.
Miyazaki, T., and N. Tezuka, 1995, J. Magn. Magn. Mater.
139, L231.
Mochel, M., C. Humphreys, J. Eades, J. Mochel, and A. Petturd,
1983, Appl. Phys. Lett. 42, 38.
Mönch, W., 1990, Rep. Prog. Phys. 53, 221.
Moodera, J. S., L. R. Kinder, T. M. Wong, and R. Meservey,
1995, Phys. Rev. Lett. 74, 3273.
Moreau, W. M., 1988, Semiconductor Lithography: Princi-