PhD Thesis_RuiMSMartins.pdf - RUN UNL

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In-situ XRD studies during growth of Ni-Ti SMA films and their complementary ex-situ characterization B2(110) Intensity (arb. units) Precipitate Precipitate Hf = 8 W Hf = 13 W Hf = 18 W / Ni-Ti = 40 W / Ni-Ti = 60 W / Ni-Ti = 60 W 15 16 17 18 19 20 21 (a) Scattering angle 2θ (deg) R-phase Intensity (arb. units) Precipitate R-phase Hf = 8 W Hf = 13 W Hf = 18 W Precipitate / Ni-Ti = 40 W / Ni-Ti = 60 W / Ni-Ti = 60 W R-phase 15 16 17 18 19 20 21 Scattering angle 2θ (deg) (b) Fig. 3.81: XRD spectra of the NiTiHf samples deposited at ROBL (V b = −45 V); (a) obtained insitu after deposition, during the annealing period at ≈ 470°C, (b) at RT. The XRD evaluation of phase transformation during cooling for the NiTiHf film from Fig. 3.80 is given in Fig. 3.82. The higher transformation temperatures of the NiTiHf SMA, when compared to what was previously observed for Ni-Ti films, have been confirmed by XRD. Chapter 3 – Results 169
In-situ XRD studies during growth of Ni-Ti SMA films and their complementary ex-situ characterization B2(110) => R-phase Intensity (arb. units) 10 6 10 5 10 4 10 7 R-phase H fN (111) R-phase HfN(200) 200°C 162°C 138°C 117°C 100°C 87°C 67°C 10 3 14 15 16 17 18 19 20 Scattering angle 2θ (deg) Fig. 3.82: XRD evaluation of phase transformation during cooling for the NiTiHf film from Fig. 3.80. These results have confirmed the advantage of the dual magnetron-sputtering-chamber installed at ROBL for future fabrication and characterization of ternary SMAs. Chapter 3 – Results 170
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RUI MIGUEL DOS SANTOS MARTINS IN-SI
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ACKNOWLEDGEMENTS The research work
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At CENIMAT, Luís Pereira also carr
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SUMÁRIO O fabrico de películas fi
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LIST OF SYMBOLS AND ABREVIATIONS α
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TABLE OF CONTENTS Introduction ....
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LIST OF FIGURES Fig. 1.1: Power/wei
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Fig. 2.3: Calculated integrated pho
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Fig. 3.25: Pole figures of Ni-Ti B2
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Fig. 3.66: SAED pattern obtained on
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LIST OF TABLES Tab. 1.1: Factors af
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In-situ XRD studies during growth o
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