27.12.2013 Views

PhD Thesis_RuiMSMartins.pdf - RUN UNL

PhD Thesis_RuiMSMartins.pdf - RUN UNL

PhD Thesis_RuiMSMartins.pdf - RUN UNL

SHOW MORE
SHOW LESS

Create successful ePaper yourself

Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.

In-situ XRD studies during growth of Ni-Ti SMA films and their complementary ex-situ characterization<br />

future fabrication of films with a combination of superelasticity and shape memory<br />

characteristics.<br />

The sputtering equipment installed at ROBL is also a very efficient instrument to<br />

deposit, and simultaneously follow in situ the evolution of the structure of ternary alloys like,<br />

NiTiHf films:<br />

- a preferential growth of oriented grains of the B2 phase from the beginning of<br />

the deposition could be obtained using a HfN buffer layer;<br />

- the increasing amount of Hf incorporated in NiTiHf films shifts the B2(110) peak<br />

towards lower 2θ (higher d-spacings) and decreases its intensity;<br />

- the higher transformation temperatures of the NiTiHf SMA, when compared to what<br />

was previously observed for Ni-Ti films, have been confirmed by XRD.<br />

5.2. FUTURE WORKS<br />

Based on our experiences with the successful versatility of sputter deposition<br />

chambers with two magnetrons and in view of the potential of combining the deposition with<br />

energetic ion bombardment for growth assistance or amorphization, an additional ion gun (IQ<br />

100 [175]) has been commissioned (during the final period of this <strong>PhD</strong> thesis work) to allow<br />

post-deposition ion irradiation or ion bombardment during sputter deposition (Fig. 5.1). The<br />

ion gun operating under a fixed incidence angle of 20° to the substrate normal can deliver<br />

energetic ions of ≤ 6 keV and up to 10 µA current. It has a sub-mm focus and a maximum<br />

scanning field of 10 × 10 mm 2 . Separate differential pumping allows its operation<br />

independent from the working pressure for magnetron sputtering, characteristically in the<br />

range from 0.1 to 1 Pa. The first experiments with in-situ XRD observation of film growth<br />

and post-deposition surface modification have been performed for the study of a Ni-Ti<br />

sample.<br />

Following the first experiments described in this thesis on the in-situ analysis of the<br />

sputtering of Ni-Ti films and the preliminary results obtained on the in-situ study of the<br />

energetic ion bombardment of this type of SMA films, it is suggested that future experiments<br />

should be dedicated to study changes of film properties by energetic ion irradiation during<br />

deposition. Energy and flux of the ions delivered by the gun can be varied independently of<br />

the ions and atoms from the magnetron targets.<br />

Chapter 5 – Conclusion and Future Works 203

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!