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In-situ XRD studies during growth of Ni-Ti SMA films and their complementary ex-situ characterization [30] H. Kahn, M.A. Huff, A.H. Heuer, The TiNi shape-memory alloy and its applications for MEMS, J. Micromech. Microeng. 8 (1998) 213-221. [31] M. Bendahan, K. Aguir, J.L. Seguin, H. Carchano, NiTi thin films as a gate of MOS capacity sensors, Sens. Actuators 74 (1999) 242-245. [32] T.-H. Nam, J.-H. Kim, M.-S. Choi, H.-W. Lee, Y.-W. Kim, Phase transformation behavior in Ti-Ni alloy ribbons fabricated by melt spinning, J. Phys. IV 112 (2003) 893- 896. [33] H. Xing, H.Y. Kim, S. Miyazaki, Microstructures of Ti-48%Ni shape memory meltspun ribbons, Trans. Nonferrous Met. Soc. China 16 (2006) s92-s95. [34] A. Rockett, Lecture notes; “Sputter deposition of thin films”, University of Illinois, U.S.A., 1998. [35] M.A. Lieberman and A.J. Lichtenberg, Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994), pp. 450-470. [36] S.I. Shah in: Handbook of Thin Film Process Technology, edited by D.A. Glocker and S.I. Shah (IOP, Philadelphia, 1995) Chap. 3, pp. 3.0:1-3.0:18. [37] AJA International, P.O. Box 246, 809 Country Way, North Scituate, MA 02060, http://ajaint.com [38] J.H. Brophy in: The Structure and Properties of Materials, Vol. 2. Thermodynamics of Structure, edited by J.H. Brophy, R.M. Rose, and J. Wulff (Wiley, New York, 1964), pp. 82. [39] B.A. Movchan, A.V. Demchishin, Study of the structure and properties of thick vacuum consensates of nickel, titanium, tungsten, aluminium oxide and zirconium dioxide, Phys. Met. Metallogr. 28 (1969) 83-90. [40] J.A. Thornton, Influence of apparatus geometry and deposition conditions on structure and topography of thick sputtered coatings, J. Vac. Sci. Tecnol. 11 (1974) 666-670. [41] P.B. Barna, and M. Adamik, Fundamental structure forming phenomena of polycrystalline films and the structure zone models, Thin Solid Films 317 (1998) 27-33. [42] C.V. Thompson, Structure Evolution During Processing of Polycrystalline Films, Annu. Rev. Mater. Sci. 30 (2000) 159-190. [43] Handbook of Hard Coatings: Deposition Technologies, Properties and Applications, edited by Rointan F. Bunshah, University of California Los Angeles UCLA, Los Angeles, California, Noyes Publications, Park Ridge, New Jersey, U.S.A., William Andrew Publishing, LLC, Norwich, New York, U.S.A. [44] J.M. Nieuwenhuizen and H.B. Haanstra, Microfractography of thin films, Philips Tech. Rev. 27 (1966) 87-91. [45] L. Dong, R.W. Smith, D.J. Srolovitz, A two-dimensional molecular dynamics simulation of thin film growth by oblique deposition, J. Appl. Phys. 80 (1996) 5682- 5690. References 211
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RUI MIGUEL DOS SANTOS MARTINS IN-SI
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ACKNOWLEDGEMENTS The research work
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At CENIMAT, Luís Pereira also carr
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SUMÁRIO O fabrico de películas fi
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LIST OF SYMBOLS AND ABREVIATIONS α
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TABLE OF CONTENTS Introduction ....
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LIST OF FIGURES Fig. 1.1: Power/wei
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Fig. 2.3: Calculated integrated pho
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Fig. 3.25: Pole figures of Ni-Ti B2
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Fig. 3.66: SAED pattern obtained on
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LIST OF TABLES Tab. 1.1: Factors af
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In-situ XRD studies during growth o
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