Novel Dielectric Etch Solution for FIB Circuit Edit: Application ... - Imec

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When XeF 2 is in use, Tungsten lines

are etched faster than dielectric!

XeF2

NDE

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When XeF 2 is in use, Tungsten lines are etched faster than dielectric! XeF2 NDE

Testing Selectivity of Etching Dielectric over Tungsten using NDE Purposefully over-etched W lines are still protecting dielectric under them while dielectric around is removed down to poly layer Rough estimate of selectivity is ~ 4 - 6

Page 1 and 2: Novel Dielectric Etch Solution for
Page 3 and 4: What Novel Dielectric Etch (NDE) is
Page 5 and 6: What NDE is good for • Allows to
Page 7 and 8: Exposure of Tungsten lines from und
Page 9: When XeF 2 is in use, Tungsten line

Novel Dielectric Etch Solution for FIB Circuit Edit: Application ... - Imec

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