19.11.2014 Views

PISCES-2ET and Its Application Subsystems - Stanford Technology ...

PISCES-2ET and Its Application Subsystems - Stanford Technology ...

PISCES-2ET and Its Application Subsystems - Stanford Technology ...

SHOW MORE
SHOW LESS

Create successful ePaper yourself

Turn your PDF publications into a flip-book with our unique Google optimized e-Paper software.

Physical Models<br />

interface. All the models discussed so far are of local field nature. In next section we will discuss two<br />

non-local models, both developed at University of Texas, Austin.<br />

3.1.2.5 Shin’s Non-local Transverse Field Models<br />

A non-local mobility model is the one in which the mobility is not solely determined by the local<br />

electric field <strong>and</strong> there are some non-local quantities in the mobility formulation. For example, the<br />

mobility in the inversion layer at the surface of the substrate below the gate oxide may also be affected<br />

by the inversion layer conditions (layer thickness, etc.). In the following, we first provide the model<br />

formulation <strong>and</strong> then state briefly the requirement on the user input. The first model, invoked by<br />

parameter oldtfld in model card has the following dependence [11]:<br />

µ ( N, T L , E ⊥ , E || )<br />

=<br />

µ 0 ( N, T L , E ⊥ ) E ⊥ – E<br />

--------------------------------- --------------------------------------- dµ 0 0<br />

+<br />

---------<br />

µ 0 E ||<br />

1 + -----------<br />

⎝<br />

⎛ µ 0 E ||<br />

⎠<br />

⎞2 1 + -----------<br />

⎝<br />

⎛ ⎠<br />

⎞2<br />

3 ⁄ 2dE ⊥<br />

v sat<br />

v sat<br />

(3.24)<br />

where the dependence of µ 0 is listed only once. Note that all four parameters, N, T L , E ⊥ , <strong>and</strong> E || are<br />

functions of space, so are µ <strong>and</strong> µ 0 . The non-locality is represented by the quantity of E 0 which is<br />

defined as the transverse electric field at the edge (i.e. bottom) of the inversion layer. The inversion<br />

layer edge is in turn determined by the criterion that the inverted carrier concentration starts to drop<br />

below the doping density. The expression for is<br />

µ 0<br />

where<br />

µ 0 ( N, T L , E ⊥ )<br />

=<br />

⎛ ------------------------ 1<br />

3.2 –9<br />

×10 --T p 1 ⁄ 2<br />

+<br />

⎞ – 1<br />

⎝ – 5 ⁄ 2<br />

1150T<br />

z L<br />

⎠<br />

L<br />

(3.25)<br />

3 ⁄ 2<br />

p = 0.09T L + 1.5×10<br />

–8<br />

N f<br />

----------------<br />

n 1 ⁄ 4 T L<br />

(3.26)<br />

0.039T<br />

z<br />

L 1.24×10<br />

= ------------------- + ------------------------------<br />

E ⊥ + E<br />

------------------ 0 ⎛<br />

E ⊥ + E<br />

------------------ 0 ⎞ 1 ⁄ 3<br />

2 ⎝<br />

2<br />

⎠<br />

(3.27)<br />

where n is the inverted carrier density in the inversion layer <strong>and</strong> in this particular case is the electron<br />

concentration for the n-channel MOSFET, <strong>and</strong> N f is the fixed interface charge per unit area at the Si/<br />

–5<br />

<strong>PISCES</strong>-<strong>2ET</strong> – 2D Device Simulation for Si <strong>and</strong> Heterostructures 23

Hooray! Your file is uploaded and ready to be published.

Saved successfully!

Ooh no, something went wrong!