Langmuir probe study of the plasma parameters in the HiPIMS ...

More documents

Recommendations

Info

Outlinedc Magnetron Sputtering DischargeElectron densityElectron energy distributionHigh power impulse magnetronsputtering discharge (HiPIMS)Summary of earlier workExperimental apparatus and setupPlasma parameters in the HiPIMSdischargeElectron densityElectron energy distributionPlasma potentialSummary
Planar dc Magnetron Sputtering DischargeFor a typical dc planar magnetron dischargepressure of 1 – 10 mTorra magnetic field strength of 0.01 – 0.05 Tcathode potentials 300 – 700 Velectron density in the substrate vicinity is 10 15 − 10 17 m −3low fraction of the sputtered material is ionized ∼ 1 %the majority of ions are the ions of the inert gasthe sputtered vapor is mainly neutral
Page 1: Langmuir probe study of the plasmap
Page 5 and 6: High Power Impulse Magnetron Sputte
Page 7 and 8: HiPIMS - Electron density - summary
Page 9 and 10: HiPIMS - ExperimentThe goal of this
Page 11 and 12: Plasma parameters - Langmuir probeA
Page 13 and 14: HiPIMS - Electron density10 19 axia
Page 15 and 16: HiPIMS - Plasma potentialV pl[V]654
Page 17 and 18: HiPIMS - Electron energyThe measure
Page 19 and 20: HiPIMS - Electron energyDuring the
Page 21 and 22: AcknowlegdementsCan be downloaded a

Langmuir probe study of the plasma parameters in the HiPIMS ...

You also want an ePaper? Increase the reach of your titles

Delete template?

Save as template?