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NOGUET et al.: CONSIDERING MICROELECTRONIC TRENDS IN ADVANCED WIRELESS SYSTEM DESIGN 113<br />

II. TRENDS IN SILICON TECHNOLOGIES<br />

Wireless technology has benefited from the advances the<br />

silicon technology has offered <strong>in</strong> the 1990s <strong>and</strong> 2000s. The<br />

whole telecommunication mutation from the analog doma<strong>in</strong><br />

to the digital realm has <strong>in</strong> fact been made possible by the<br />

m<strong>in</strong>iaturisation of transistors, lead<strong>in</strong>g to higher density though<br />

with low power efficient ICs. In turn, this move to digital<br />

communication has created the boom of the digital ICT at<br />

all layers, from broadb<strong>and</strong> communications to multimedia<br />

services. With this <strong>in</strong> m<strong>in</strong>d, it would not make sense to<br />

foresee what telecommunication will offer <strong>in</strong> the future without<br />

consider<strong>in</strong>g the trends <strong>in</strong> silicon technology research <strong>and</strong><br />

<strong>in</strong>dustry. The key factor beh<strong>in</strong>d the digital revolution has been<br />

the CMOS technology down-scal<strong>in</strong>g follow<strong>in</strong>g the so-called<br />

Moores Law which co<strong>in</strong>ed <strong>in</strong> the early 70s that the number<br />

of transistors would double every year. Although this rule has<br />

been validated over the 40 last years by the silicon <strong>in</strong>dustry<br />

<strong>and</strong> by the ITRS [2], it is agreed that we are com<strong>in</strong>g to a new<br />

era where this rule is no longer valid. Several reasons can be<br />

identified:<br />

• The physics of silicon <strong>in</strong>troduces side effects <strong>in</strong> deep submicron<br />

technology,<br />

• Predictability of transistors behaviour is gett<strong>in</strong>g less accurate,<br />

lead<strong>in</strong>g to lower yield or less optimal usage of<br />

silicon,<br />

• Power density is go<strong>in</strong>g to levels beyond what cool<strong>in</strong>g can<br />

offer,<br />

• Static power <strong>in</strong>creases which makes no longer valid the<br />

assumption that the overall power consumption decreases<br />

as transistors shr<strong>in</strong>k,<br />

• Investments needed for new deep sub-micron CMOS are<br />

be<strong>in</strong>g so huge that only less than a h<strong>and</strong>ful of application<br />

justifies it.<br />

For all these reasons, it is likely that we are on the verge of<br />

significant changes <strong>in</strong> the silicon capability roadmap, which<br />

make the analysis of future trends useful. Indeed, it is foreseen<br />

that the roadmap has to move from a pure down-scal<strong>in</strong>g to new<br />

functionalities <strong>and</strong> comb<strong>in</strong>ed technology vs. system <strong>in</strong>novation<br />

<strong>in</strong> order to manage future power, variability <strong>and</strong> complexity<br />

issues. However, there is no accepted c<strong>and</strong>idate today to<br />

replace CMOS devices consider<strong>in</strong>g the four essential metrics<br />

needed for successful applications: dimension (scalability),<br />

switch<strong>in</strong>g speed, energy consumption <strong>and</strong> throughput [4], [5].<br />

Moreover, when other metrics such as reliability, designability,<br />

<strong>and</strong> mixed-signal capability are added, the dom<strong>in</strong>ance<br />

of CMOS is even more obvious. It is then realistic to th<strong>in</strong>k<br />

that other micro or nano-technologies should be seen as future<br />

add-ons to CMOS <strong>and</strong> not as a substitute for it [6]. This<br />

transition between the “bus<strong>in</strong>ess as usual” era <strong>and</strong> the entry to<br />

the post 2015 1 period where new alternative or complementary<br />

solutions need to be found is depicted <strong>in</strong> Fig. 1.<br />

Bear<strong>in</strong>g <strong>in</strong> m<strong>in</strong>d this disruptive future <strong>and</strong> rather than<br />

extend<strong>in</strong>g the technology evaluation proposed by the ITRS,<br />

1 2015 is generically considered as the end of CMOS scal<strong>in</strong>g because it has<br />

been shown that <strong>channel</strong> length will reach dimensions where the MOS device<br />

pr<strong>in</strong>ciple no longer operates.<br />

2 Source: Robert Chau, Intel, presentation at ICSICT, 2004.<br />

3 Source: IMEC, 2006.<br />

Fig. 1. Technology nodes <strong>and</strong> predicted end of CMOS downscal<strong>in</strong>g<br />

with possible alternatives (nanotubes <strong>and</strong> nanowires) for post-2015<br />

nanotechnology 2<br />

Fig. 2. Technology roadmap mirror<strong>in</strong>g the European vision 3<br />

technology analysis carried out <strong>in</strong> Europe by EUREKA Medea<br />

experts [6] suggests consider<strong>in</strong>g 3 major paradigms:<br />

• More Moore: correspond<strong>in</strong>g to ultimate CMOS scal<strong>in</strong>g<br />

• More than Moore: correspond<strong>in</strong>g to the use of heterogeneous<br />

technologies such as Micro Electro Mechanical<br />

Systems (MEMS) or Micro-Opto-Electro Mechanical<br />

Systems (MOEMS)<br />

• Beyond CMOS: correspond<strong>in</strong>g to nanotechnology alternatives<br />

to CMOS.<br />

A. More Moore<br />

This ultimate scal<strong>in</strong>g of CMOS will be essential to supply<br />

the massive comput<strong>in</strong>g power <strong>and</strong> communication capability<br />

needed for the realisation of European Ambient Intelligence<br />

(AmI) applications at an affordable cost <strong>and</strong> a power efficiency<br />

exceed<strong>in</strong>g 200 GOPS/Watt for programmable <strong>and</strong>/or reconfigurable<br />

architectures [7]. However, reach<strong>in</strong>g this ultimate<br />

CMOS node at the deca-nanometre level around the year 2015<br />

will require address<strong>in</strong>g cumulative <strong>in</strong>terrelated challenges surveyed<br />

<strong>in</strong> [8], [9].<br />

In the process technology doma<strong>in</strong>, major challenges are: the<br />

massive <strong>in</strong>troduction of new materials, the <strong>in</strong>troduction of new<br />

device architectures, the move to Extreme Ultra-Violet (EUV)<br />

litho or nano-impr<strong>in</strong>t lithography, the <strong>in</strong>crease of r<strong>and</strong>om<br />

device <strong>and</strong> <strong>in</strong>terconnect variability especially <strong>in</strong> memories,<br />

the reach of limit of Cu <strong>in</strong>terconnects (e-migration, cross-talk,<br />

etc.), the conflict between dynamic <strong>and</strong> static power density.

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