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J U L Y 2 0 0 9 i s s u e n ° 1 1<br />

N e w s l e t t e r o n 3 D I C , T S V , W L P & E m b e d d e d T e c h n o l o g i e s<br />

C O M P A N Y P R O F I L E<br />

SET: Die/Flip chip B<strong>on</strong>ders able to align and b<strong>on</strong>d<br />

fragile comp<strong>on</strong>ents at 0.5 μm post b<strong>on</strong>d accuracy<br />

SET, Smart Equipment Technology, based in Saint-Jeoire, France, is a world leading<br />

supplier of High Accuracy Die-to-Die and Die-to-Wafer B<strong>on</strong>ders and versatile Nanoimprint Lithography (NIL) soluti<strong>on</strong>s.<br />

Company backgrounder<br />

In the early 1980s, SET has pi<strong>on</strong>eered in<br />

the development of flip chip b<strong>on</strong>ders for the<br />

hybridizati<strong>on</strong> of infrared imagers and the assembly<br />

of optoelectr<strong>on</strong>ics devices, by delivering the first<br />

commercially available Flip Chip B<strong>on</strong>der <strong>on</strong> the<br />

market and introducing an image superimposing<br />

microscope which established<br />

SET as the industry leader for high accuracy<br />

placement. Supplier of semic<strong>on</strong>ductor equipment<br />

dedicated to highend applicati<strong>on</strong>s for over 30 years<br />

and with around 300 Device B<strong>on</strong>ders installed<br />

worldwide, SET is globally renowned for the<br />

unsurpassed accuracy and the flexibility of its flip<br />

chip b<strong>on</strong>ders. SET encompasses a structure in<br />

North America and offers a comprehensive product<br />

portfolio of die/flip chip b<strong>on</strong>ders for fast growing<br />

markets, serving clients through a global network<br />

of representatives and in-depth customer trainings.<br />

Since 2008, SET is a wholly owned subsidiary of<br />

Replisaurus Technologies.<br />

Product lines & technologies<br />

SET, employing 57 pers<strong>on</strong>s in France, has a l<strong>on</strong>g<br />

history in the development and producti<strong>on</strong> of high<br />

precisi<strong>on</strong> tools. This includes Chip-to-Chip or<br />

Chip-to-Wafer die b<strong>on</strong>ders for 3D-IC integrati<strong>on</strong>,<br />

versatile Nanoimprinting Lithography Steppers and<br />

the Process Module for the innovative Replisaurus'<br />

ECPR technology.<br />

- Device B<strong>on</strong>ding<br />

SET develops and manufactures pieces of equipment<br />

addressing future challenges and fine pitch<br />

applicati<strong>on</strong>s for high density integrati<strong>on</strong>. Primarily<br />

targeting low-volume and R&D applicati<strong>on</strong>s, the<br />

current SET b<strong>on</strong>der portfolio covers a wide range<br />

of b<strong>on</strong>ding applicati<strong>on</strong>s with the ability to handle<br />

and b<strong>on</strong>d fragile and small comp<strong>on</strong>ents <strong>on</strong>to large<br />

substrate or <strong>wafer</strong>. As the industry is poised to move<br />

3D packaging technology from labs to producti<strong>on</strong>,<br />

SET is actively engaged in European Programs<br />

including the development of High Accuracy,<br />

High Precisi<strong>on</strong> placement tools addressing the<br />

3D-IC integrati<strong>on</strong> with Through Silic<strong>on</strong> Via (TSV)<br />

technology.<br />

The recent introducti<strong>on</strong> <strong>on</strong> the market of their<br />

SETFC300 has offered a timely resp<strong>on</strong>se to the<br />

current research activities in this area.<br />

Products developpements & Current<br />

R&D projects<br />

Interview with Gilbert Lecarpentier,<br />

Business Development Manager at SET<br />

Yole Développement: What is historically the<br />

key b<strong>on</strong>ding applicati<strong>on</strong> for SET b<strong>on</strong>ders?<br />

Gilbert Lecarpentier: SET b<strong>on</strong>ders have been<br />

used successfully for over three decades to<br />

hybridize Infrared Imagers which c<strong>on</strong>sists of<br />

b<strong>on</strong>ding a compound semic<strong>on</strong>ductor <strong>on</strong> silic<strong>on</strong><br />

CMOS readout. Thanks to their unrivalled<br />

accuracy and versatility, SET tools are now used<br />

by all major IR-FPA providers.<br />

YD: What represents 3D applicati<strong>on</strong>s for SET<br />

in its short, medium and l<strong>on</strong>g term strategy?<br />

GL: High-end IR-FPA and 3D applicati<strong>on</strong>s is the<br />

current market for our FC300, mainly because<br />

3D-IC is still in R&D. In l<strong>on</strong>ger term, 3D-IC is the<br />

opportunity for SET to enter into the producti<strong>on</strong><br />

market; it is the driver for the development of<br />

a High Accuracy, High Speed platform. 3D-IC<br />

with its increasing demand of High Accuracy<br />

producti<strong>on</strong> C2W b<strong>on</strong>der is likely to become the<br />

main market for SET b<strong>on</strong>ders.<br />

YD: Wafer-to-<strong>wafer</strong> is perceived as a cost<br />

effective technology for some 3D applicati<strong>on</strong>s;<br />

what are the 3D applicati<strong>on</strong>s likely to require<br />

die-to-die or die-to<strong>wafer</strong> assembly?<br />

GL: Except for the memory market which can be<br />

addressed by <strong>wafer</strong> to <strong>wafer</strong> b<strong>on</strong>ding because of<br />

the high yield and the same die size, most of the<br />

other 3D applicati<strong>on</strong>s such as Memory <strong>on</strong> Logic or<br />

heterogeneous integrati<strong>on</strong> are candidates for the<br />

Chip to Wafer approach. SET b<strong>on</strong>ders are wellsuited<br />

for heterogeneous integrati<strong>on</strong>; the b<strong>on</strong>ding<br />

of GaAs epitaxial layer to Silic<strong>on</strong> substrate has<br />

been successfully dem<strong>on</strong>strated for a LED printer<br />

applicati<strong>on</strong>. SET b<strong>on</strong>ders have already been used<br />

for memory stack; the SAMSUNG memory stack<br />

shown by everybody in every 3D c<strong>on</strong>ference<br />

was performed <strong>on</strong> the SET-FC250 platform and<br />

the LETI has performed memory stack <strong>on</strong> SET-<br />

FC150 as early as 1997.<br />

YD: What is SET involvement in research<br />

programs for 3D integrati<strong>on</strong>?<br />

GL: SET has recently joined the IMEC’s Industrial<br />

Affiliati<strong>on</strong> Program (IIAP) <strong>on</strong> 3D integrati<strong>on</strong>. The<br />

High Accuracy (0.5μm), High Force (400kgf) Die<br />

B<strong>on</strong>der SET-FC300 is installed at IMEC and<br />

is used for developing processes with scaling<br />

capability for high throughput machine. In this<br />

3-Year JDP, SET supports the tool and the<br />

eventual modificati<strong>on</strong>s required for achieving the<br />

program, and collaborates with IMEC to develop<br />

high alignment accuracy pick-and-place as well as<br />

low Temperature b<strong>on</strong>ding processes as required<br />

by advanced 3D integrati<strong>on</strong> schemes. SET and its<br />

mother company Replisaurus are partners of the<br />

European Project JEMSiP_3D. SET c<strong>on</strong>tributes<br />

in this 3-Year program with the development and<br />

the validati<strong>on</strong> of a High Speed, High Accuracy Die<br />

B<strong>on</strong>der required for the high volume producti<strong>on</strong> of<br />

3D devices using the TSV technology.<br />

Some other R&D projects, focusing <strong>on</strong> the<br />

development of alternative b<strong>on</strong>ding methods<br />

enabling higher throughput are also in discussi<strong>on</strong>.<br />

YD: SET also proposes Nanoimprinting<br />

Tools; what do you foresee as the main<br />

market drivers for this technology; is SET<br />

involved in research programs dedicated to<br />

Nanoimprinting Lithography?<br />

GL: After a big push few years ago of the<br />

semic<strong>on</strong>ductor market, it seems that the main<br />

markets short and mid terms are the pattern media<br />

and the optoelectr<strong>on</strong>ics or optics; phot<strong>on</strong>ic crystal,<br />

light extracti<strong>on</strong> enhancement, antireflective layer,<br />

etc.<br />

The SET-NPS300, a versatile Nanoimprinting<br />

tool using a step and repeat approach has been<br />

developed in the frame of the completed 4-Year<br />

European program NaPa. SET is currently partner<br />

of another 4-Year European project NaPANIL,<br />

targeting scalable nanomanufacturing processes<br />

for arbitrary 3-dimensi<strong>on</strong>al surfaces in the fields<br />

of optical comp<strong>on</strong>ents and life sciences. For SET,<br />

the key outcome of this framework is an alignment<br />

capability below 50nm.<br />

12<br />

Printed <strong>on</strong> recycled paper<br />

- Nano Imprinting<br />

Its experience in high accuracy placement has<br />

enabled SET to bring to the market the cuttingedge<br />

Nanoimprinting Stepper (NPS300) at proven<br />

submicr<strong>on</strong> alignment capabilities combined with<br />

superior flexibility. Nanoimprinting lithography<br />

c<strong>on</strong>sists of transferring the pattern of a stamp into a<br />

thermoplastic or UV-Cured material. This innovative<br />

technology is a very promising soluti<strong>on</strong> for replacing<br />

standard UVlithography systems at nano scale<br />

and reas<strong>on</strong>able cost. Applicati<strong>on</strong>s include phot<strong>on</strong>ic<br />

crystal, antireflective or functi<strong>on</strong>alized layer as well<br />

as 3-dimensi<strong>on</strong>al replicati<strong>on</strong>.<br />

Gilbert Lecarpentier, Business Development Manager<br />

After studying electr<strong>on</strong>ics in Caen, Calvados (France), Gilbert worked at Philips<br />

for 4 years designing special equipment for use in semic<strong>on</strong>ductor producti<strong>on</strong> lines.<br />

In 1977, he joined Sulzer Electro Technique (S.E.T.) for developing equipment for<br />

semic<strong>on</strong>ductor processing, such as Mask Aligner, Spinner, Prober, Laser Marker,<br />

Laser Scriber and Flip Chip B<strong>on</strong>der. When <str<strong>on</strong>g>SUSS</str<strong>on</strong>g> MicroTec acquired SET in 1993,<br />

Gilbert took the product management resp<strong>on</strong>sibility of the device b<strong>on</strong>der product<br />

line. After the Management Buy Out of the <str<strong>on</strong>g>SUSS</str<strong>on</strong>g> MicroTec Device B<strong>on</strong>der Divisi<strong>on</strong><br />

in July 2007, he assumes the role of business development manager for this product line and the<br />

newly developed Nano imprinting Stepper within the new company renamed SET, Smart Equipment<br />

Technology.

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