SESHA 2011 Program Book - Semiconductor Safety Association

3:15 pm Break & Raffle Drawing, Exhibit Hall
3:45 pm Research of Reduction Carbon Dioxide
Emission by Applying Microalgae Biotech in Semiconductor
Factory
Ching-Lung, C; Powerchip Technology
Industrial activities have improved human life, but
also have increased greenhouse gases (GHG) emission
into atmosphere, to cause the rising of the Earths average
temperature and the other serious environmental
problems. For solving these problems, there are many
carbon reduction technologies are under development
and application fast, such as physical treatment, chemical
treatment and biological fixation. Today we plant
a lot of trees to fix and transfer carbon dioxide(carbon
sink) for the sake of carbon reduction. Therefore, carbon
capture and storage have also been considered as
an indispensable option to reduce carbon emission. Extensive
research has been conducted to evaluate the feasibility
of large-scale permanent carbon storage in oil
fields and ocean beds. These carbon storage methods
appear to be the potential solution for carbon reduction,
but the highly cost, long-term stability, carbon reduction
effect remains questionable. Microbial photosynthesis,
particularly by microalgae, is now being reconsidered as
a viable technology to reduce carbon. These processes
are also attractive because the microbial extracts may
possess substantial commercial values such as dietary
supplements and fuels. In this study, we design an integrated
CO2 biofixation system that consists of three
parts, including CO2 scrubber system, and submerged
membrane harvesting system. A laboratory-scale system
was built to investigate the technical feasibility, and the
pilot-scale system has been subsequently installed on
semiconductor manufacture factory to reduce CO2 that
emit from boiler process exhaust. The boiler use nature
gas as fuel, and its exhaust contain CO2 about rather
consistent at 16.1% and its temperature fluctuates between
50 and 60°C. We used wet scrubber to wash CO2
into water and supplied the carbon resource to grow microalgae
in the close-loop photobioreactors, and microbial
photosynthesis processes are designed to achieve
faster growth rate, better carbon fixation efficiency, and
greater growth density, then we generate and gain the
concentrated microalgae in the membrane harvesting
system. Microalgal CO2 Fixation appear to be a potential
solution for carbon reduction in the semiconductor
fab. In the future, we will plan to combine regenerating
energy to develope a cost-effective energy-saving systems
and try to test the large module. The test results
15
will provide reliable data to reduce carbon emissions in
the semiconductor fab.
4:30 pm Environmentally Benign In-Line Cleaning
Solutions for Advanced Semiconductor Manufacturing
Chen, T, Hogan, T, Korzenski, M; ATMI, Intermolecular
The immersion lithography has been critical to the
continued performance improvements of semiconductor
devices as well as to the overall economics of the semiconductor
industry because it offers both a technical solution
to meeting the minimum resolution for the shrinking
critical dimension in a device and a cost-effective
approach to continue using large amounts of the existing
lithographic tooling infrastructure and patterning materials.
However in order to achieve similar defectivity
levels as compared to dry lithography, enormous efforts
have to be put on identifying, classifying, determining the
root cause of various defects associated with immersion
lithography, and eventually addressing the defectivity issues
without affecting the high process yields. An efficient
in-line cleaning of the immersion hood periodically is a
part of the strategy to maintain the low defectivity level
in semiconductor industry. With the aid of combinatorial
screening tools, we developed novel, low odor, and environmentally
benign formulations for a time and cost effective
in-line cleaning method of the immersion hood.
10:00 am-3:15 pm
PV/Solar Manufacturing EHS
Sonora C
10:00 am SF6 Massive-Scale Decomposition Technology
and Clean Development Mechanism Project
in TFT-LCD Industry, South Korea
Choi, J; KDIA
South Korean LCD industry has been investing new
generation LCD fab since early 2000s, thus it has the line
up from 2nd generation to 8th generation of LCD fab. As
production expanded, greenhouse gas emission also has
been increased. Within the greenhouse gas, SF6 gas is the
major gas, which is used as an etching agent in dry etching
process and its global warming potential is over 20,000
times higher than CO2. SF6 abatement technology was
already developed, which can treat about 1 cubic meter
of exhaust per minute. However, as the LCD generation
increasing, the amount of process exhaust has been increasing
sharply. In this circumstance, to abate SF6 gas,
several small-scaled abatements should be installed in
point-of-use (POU), i.e. right after each process chamber
of dry etchers. Thus, there are two major problems for SF6