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Laser Lift-off Process

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Patterned LLO technology<br />

[Patent: I287309(ROC)]<br />

<strong>Laser</strong> Beam<br />

Mask<br />

Patterned<br />

<strong>Laser</strong> Beam<br />

300×300, 230×230 1000×1000<br />

S. J. Wang et al., Appl. Phys. Letts, vol. 87, 2005<br />

360×360, 90 ×90 unit: μm 2<br />

S. L. Chen et al., IEEE Photon. Technol. Lett, vol. 19,<br />

41<br />

2007<br />

unit: μm 2<br />

Die size: 300 × 300 μm 2<br />

Die size: 1000 × 1000 μm 2<br />

42<br />

18

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