+ R - Center for Nanoscale Systems - Harvard University

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EllipsometryGaertner Single WavelengthScanning Ellipsometer (ES-2)J.A Woollam WVASE32 (ES-1)150nm SiO 2 on SiliconRefractive Index (n)30nm SiO 2 on Silicon
ProfilometryTwo Main Types of Profilometry:1) Contact/Stylus Surface Profilometer-Veeco Dektak 6M and KLA-Tencor P16 (PL-3/4/5)-Vertical Step Height (SH): 5nm to 260um-Scan Size: 100um to 50mm-Lateral Resolution: 1-2umDektak 6MCCI HD2) Optical (Interferometer) Surface Profiler-Veeco WykoNT1100 and Taylor Hobson CCI HD (PL-2/6)-Vertical Step Height (SH): 0.1nm to 2mm-Scan Size/Area: 130um to 100mm-Auto Focus/Fringe Find/Scan-Local Film Thickness Measurement: 50nm to 20+umNew Tool at CNS!
Page 1 and 2: Metrology for NanofabricationThe Gr
Page 3 and 4: IntroductionMetrology:The Science o
Page 5 and 6: Metrology for Process ControlDATADe
Page 7 and 8: Optical MicroscopyCapabilities- Mor
Page 9: EllipsometryCapabilities-Polarized
Page 13 and 14: Optical ProfilometryCCI HDWyko NT11
Page 15 and 16: Optical ProfilometryAuTiSiNiFe-40nm
Page 17 and 18: Optical ProfilometryElectrode Array
Page 19 and 20: Atomic Force Microsopy (AFM)Sub-Mic
Page 21 and 22: Atomic Force Microsopy (AFM)Ti/Au o
Page 23 and 24: Atomic Force Microsopy (AFM)Si12 um
Page 25 and 26: Thin Film Characterization-1200 °C
Page 27 and 28: Electronic ConductionHummel, R.E. E
Page 29 and 30: Electronic ConductionIntrinsic Semi
Page 31 and 32: Van der Pauw Hall and ResistivityMe
Page 37 and 38: Thin Film ElectricalCharacterizatio
Page 39 and 40: Resistivity (ohm-cm)Thin Film Chara
Page 41 and 42: Mobility (cm2/V*s)Resistivity (ohm-
Page 43 and 44: Device Testing1 & 2-d NanoElectroni
Page 45: Questions?

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