+ R - Center for Nanoscale Systems - Harvard University

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lowProbabilityDistributionAccuracyhighMetrology for Process Controlx xx xxxxxxxxxxxAccuracy: (True Value)-How Close to Reference orActual ValuePrecision: (Repeatability)-Degree of Reproducibilityof a MeasurementReference/ActualAccuracyhighPrecisionlowPrecision
Metrology for Process ControlDATADesign, Model, andSimulationMetrology:Optical Microscopy (OM)Profilometry, Ellipsometry, 4-PPStation, Rs-Mapper, AFM/SPM…Cost?Destructive?Nanofabrication Process:(Front-end, Lithography, RIE,CVD, PVD, ALD, RTA, Backend…)DATAYield and PerformancePrecision?Speed?DATAMetrology:Stress Tests, Spectroscopy(Raman/FTIR/PL/XPS..), XRD,SIMS, SEM, TEM,DATA-Statistical ProcessControl (SPC)-Standard Deviation
Page 1 and 2: Metrology for NanofabricationThe Gr
Page 3: IntroductionMetrology:The Science o
Page 7 and 8: Optical MicroscopyCapabilities- Mor
Page 9 and 10: EllipsometryCapabilities-Polarized
Page 11 and 12: ProfilometryTwo Main Types of Profi
Page 13 and 14: Optical ProfilometryCCI HDWyko NT11
Page 15 and 16: Optical ProfilometryAuTiSiNiFe-40nm
Page 17 and 18: Optical ProfilometryElectrode Array
Page 19 and 20: Atomic Force Microsopy (AFM)Sub-Mic
Page 21 and 22: Atomic Force Microsopy (AFM)Ti/Au o
Page 23 and 24: Atomic Force Microsopy (AFM)Si12 um
Page 25 and 26: Thin Film Characterization-1200 °C
Page 27 and 28: Electronic ConductionHummel, R.E. E
Page 29 and 30: Electronic ConductionIntrinsic Semi
Page 31 and 32: Van der Pauw Hall and ResistivityMe
Page 37 and 38: Thin Film ElectricalCharacterizatio
Page 39 and 40: Resistivity (ohm-cm)Thin Film Chara
Page 41 and 42: Mobility (cm2/V*s)Resistivity (ohm-
Page 43 and 44: Device Testing1 & 2-d NanoElectroni
Page 45: Questions?

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