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March - April 2010 - Chip Scale Review

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Figure 15. Comparison of tiny vias with 3Dintegration TSVs28<strong>Chip</strong> <strong>Scale</strong> <strong>Review</strong>. <strong>March</strong>/<strong>April</strong> <strong>2010</strong> . [<strong>Chip</strong><strong>Scale</strong><strong>Review</strong>.com]International Electron Devices Meeting,(IEDM 2006), San Francisco, CA,December 11-13, 2006, pp. 367-370.5. Burns, J., Aull, B., Keast, C., Chen, C.,Chen, C. Keast, C., Knecht, J.,Suntharalingam, V., Warner, K., Wyatt, P.,and Yost, D., “A Wafer-<strong>Scale</strong> 3-D CircuitIntegration Technology”, IEEETransactions on Electron Devices, Vol. 53,No. 10, October 2006, pp. 2507-2516.6. Sekiguchi, M., Numata, H., Sato, N.,Shirakawa, T., Matsuo, M., Yoshikawa, H.,Yanagida, M., Nakayoshi, H., andTakahashi, K., “Novel Low Cost Integrationof Through <strong>Chip</strong> Interconnection andApplication to CMOS Image Sensor”, IEEEProceedings of Electronic Componentsand Technology Conference, San Diego,CA, May 2006, pp. 1367-1374.7. Zhang, X., T. Chai, J. H. Lau, C.Selvanayagam, K. Biswas, S. Liu, D.Pinjala, G. Tang, Y. Ong, S. Vempati, E.Wai, H. Li, B. Liao, N. Ranganathan, V.Kripesh, J. Sun, J. Doricko, and C. Vath,“Development of Through Silicon Via(TSV) Interposer Technology for LargeDie (21x21mm) Fine-pitch Cu/low-kFCBGA Package”, IEEE Proceedings ofElectronic, Components & TechnologyConference, San Diego, CA, May, 2009,pp. 305-312. (Also, accepted forpublication in IEEE Transactions inAdvanced Packaging.)8. Selvanayagam, C., J. H. Lau, X. Zhang,S. Seah, K. Vaidyanathan, and T. Chai,“Nonlinear Thermal Stress/StrainAnalysis of Copper Filled TSV (ThroughSilicon Via) and Their Flip-<strong>Chip</strong>Microbumps”, IEEE Transactions inAdvanced Packaging, Vol. 32, No. 4, Nov.2009, pp. 720-728.9. Yu, A., J. H. Lau, Ho, S., Kumar, A., Yin,H., Ching, J., Kripesh, V., Pinjala, D., Chen,S., Chan, C., Chao, C., Chiu, C., Huang, M.,and Chen, C., “Three dimensionalinterconnects with high aspect ratio TSVsand fine pitch solder microbumps.” IEEEProceedings of Electronic Componentsand Technology Conference, San Diego,CA, May 2009, pp. 350-354.10. Zhang, X., A. Kumar, Q. X. Zhang, Y.Y. Ong, S. W. Ho, C. H. Khong, V. Kripesh,J. H. Lau, D.-L. Kwong, V. Sundaram, RaoR. Tummula, Georg Meyer-Berg,“Application of Piezoresistive StressSensors in Ultra Thin Device Handlingand Characterization,” Journal of Sensors& Actuators: A. Physical, Vol. 156, Nov.2009, pp. 2-7.11. Yu, A., J. H. Lau, Ho, S., Kumar, A., Wai,Y., Yu, D., Jong, M., Kripesh, V., Pinjala, D.,Kwong, D., “Study of 15-¦Ìm-pitch soldermicrobumps for 3D IC integration.” IEEEProceedings of Electronic Componentsand Technology Conference, San Diego,CA, May 2009, pp. 6 -10.

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