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Bias Circuit

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3.1 Physical Description of the MOSFET<br />

A diagrammatic NMOS is shown in Fig. 3.1. The device consists of a three-layer structure of<br />

metal–oxide–semiconductor (MOS). A two-terminal MOS structure (connections to metal and<br />

semiconductor) is essentially a parallel-plate capacitor. In the same manner as for a normal<br />

capacitor, when a positive gate voltage, VG, is applied with respect to the p-type body (for<br />

NMOS) [i.e., with respect to the metal contact on the underside of the p-type semiconductor<br />

body (or substrate)], negative charges are induced under the oxide layer in the semiconductor.<br />

When VG (with respect to the semiconductor body) exceeds the threshold voltage, Vtno, a<br />

channel of free-carrier electrons forms under the oxide; that is, the onset of the channel<br />

occurs when VG = Vtno. The substrate is n type for the PMOS and the channel is made up of<br />

free-carrier holes.<br />

Figure 3.1. MOS transistor consisting of a metal – oxide –<br />

semiconductor layered structure (plus a metal body contact on the<br />

bottom). A positive gate voltage, VG > Vtno, induces a conducting<br />

channel under the oxide, which connects the two n regions, source and<br />

drain. All voltages are with respect to VB, that is, the body (substrate)<br />

of the transistor. (a) No channel; (b) uniform channel; (c) channel is<br />

just pinched off at the drain end of the channel; (d) channel length is<br />

reduced due to drain pn-junction depletion region extending out along<br />

the channel.<br />

An n-channel MOSFET device is then completed by fabricating n regions, source and gate, for<br />

contacting the channel on both ends of the channel. For VG < Vtno [Fig. 3.1(a)] there is no<br />

channel under the oxide, and the two n regions are isolated pn junctions. When VG > Vtno and<br />

source voltage, VS, and drain voltage, VD, are both zero (all with respect to the body) [Fig.<br />

3.1(b)] a uniform-thickness n-type channel exists along the length of the oxide layer and the<br />

source and drain regions are connected by the channel. Thus, the channel is a voltagecontrolled<br />

resistor where the two ends of the resistor are at the source and drain and the<br />

control voltage is applied at the gate.

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