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PROCEEDINGS OF THE 7 INTERNATIONAL ... - Fizika

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S. Mockevičienė et al. / Medical Physics in the Baltic States 7 (2009) 121 - 122<br />

Table1 Main characteristics of investigated porous silicone structures<br />

Samples HF: HNO3 Etching time, h Porous layer thickness, μm Refractive<br />

index<br />

Porosity, %<br />

N8 1:1 24 4.201 1.21 83.6<br />

N10 1:2 24 2.767 1.32 75.3<br />

N11 1:6 24 2.103 1.50 61.4<br />

N5 4:1 24 2.013 1.43 66.8<br />

N20 4:1 48 3.934 1.21 83.6<br />

N4 4:1 60 4.851 1.17 86.7<br />

a) b) c)<br />

Typical for porous silicon Si-H, Si-O-Si, SiH2 peaks<br />

were found in the initial FTIR spectra of different<br />

samples.<br />

Increase of HNO3 concentration in the acids mixture<br />

resulted in the creation of additional Si-Hx groups seen<br />

in FTIR spectrum (Fig.2). Created Si-Hx groups were<br />

responsible for the number of new formations (pores) on<br />

the sample surface.<br />

Fig.2. FTIR spectra of a sample No11 before (A) and<br />

after (B) its irradiation with X-ray photons.<br />

Spectral intensity was lower for the whole energy range<br />

after the irradiation of samples with high energy X-ray<br />

photons. In the case of the highest HNO3 concentration<br />

used for the fabrication of samples (Sample No11) it<br />

was clearly seen, that the intensity of Si-Hx bonds was<br />

lower and some bonds disappeared, thus reducing<br />

limiting property of the structure for the grow of pores<br />

into the depth, Such a behaviour most likely is related to<br />

122<br />

the release of hydrogen during the exposure of samples<br />

to X-ray photons.<br />

4. Conclusions<br />

Surface morphology and porosity of porous silicon<br />

depend on the technological parameters of vapor phase<br />

etching. Increasing concentration of HNO3 in the<br />

mixture, leads to the creation of the new formations on<br />

the sample surface and limits pore growth into the<br />

depth. Radiation induced changes of properties are not<br />

significant. However, they are related to the surface<br />

reconstruction due to the hydrogen release during<br />

irradiation. Modification of porous silicon surface using<br />

high energy photon beams is possible only in the case,<br />

when HNO3concentration in the acids mixture is<br />

relatively high.<br />

5. References<br />

1. Z. Chuan Feng, R. Tsu. Porous silicon, World<br />

Scientific, 1994, P. 465<br />

2. A.P. Hakhoyan, S.V. Melkonyan Features of the<br />

refractive index of porous silicon with gradient porosity.<br />

Armenian Journal of Physics, vol. 1, 2008, pp. 146-150;<br />

3. R Herino, G Bomchil, K Barla and C Bertrand,<br />

Porosity and pore size distribution of porous silicon<br />

layers, J Electrochem Soc, Vol 134, No 8, pp 1994 -<br />

2000 (1987).<br />

4. H. Kaabi, N. Mliki, M. Cheynet, W. Saikaly, O.<br />

Gilbert, B. Bessaïs, B. Yangui , Structural and optical<br />

properties of vapour-etching based porous silicon, 2006<br />

WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim,<br />

P 155-157.

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