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Figure 3-9 Diffraction efficiency of diffractive lens as a function of number of phase levels. 42
43 defining the structure of the lens. The resolution limit of the electron beam writer determines the smallest feature size possible for a diffractive lens. Fabrication technology limits the smallest multimask step size to approximately 0.5 urn/ 3 The minimum mask feature size for a diffractive lens with numerical aperture NA occurs at the lens edge on the M th mask and is fmin=—^ ,, NA (2 m ). 3.21 Thus the lens must be designed so fmin > 0.5 |im. Contact printing is the next step in the fabrication of the diffractive lenses. A mask is illuminated with a deep ultraviolet light source which exposes the mask pattern into a layer of photoresist on a glass substrate as shown in Figure 3-10. Assuming positive type resist, the regions of exposed photoresist under the clear portions of the mask dissolve upon chemical development leaving the unexposed portions of photoresist. The remaining photoresist pattern serves as mask stop for the etching process which follows. The etching process dissolves away the glass substrate wherever there is no photoresist and thus transfers the pattern directly into the glass substrate. To induce the proper phase shift on an incident field, the depth of the surface relief pattern must be carefully controlled. If the glass substrate is treated as a plane parallel plate, the phase delay experienced by a field traveling through the glass is
Page 1: INFORMATION TO USERS This manuscrip
Page 5 and 6: DIFFRACTIVE MICROLENSES FOR FIBER O
Page 7 and 8: ACKNOWLEDGEMENTS 3 I would like to
Page 9 and 10: 5 Page 4.3 Photoresist Deposition 4
Page 11 and 12: 7 Page 4-2 Exposure test results fr
Page 13 and 14: ABSTRACT 9 The design, fabrication,
Page 15 and 16: 11 architectures. 3,4 5 8 In all of
Page 17 and 18: 13 microlenses have been presented
Page 19 and 20: 15 element acts as an interface bet
Page 21 and 22: CHAPTER 2 17 LENS PARAMETERS FOR FI
Page 23 and 24: 19 power coupling efficiency, T, be
Page 25 and 26: lens is, 21 NAflber = ^=m^. R R . 2
Page 27 and 28: 2.3 Chromatic Aberration 23 Despite
Page 29 and 30: 25 JL 0.985 0.99 0.995 .005 .015 >r
Page 31 and 32: 27 Propagation Distance (mm) Figure
Page 33 and 34: 29 spherical wave emitted from a po
Page 35 and 36: 31 zones is used, the light from ev
Page 37 and 38: 33 OPD=Jrl+f 2 3 3 The incident pla
Page 39 and 40: 3.3 Multi-level Diffractive Lenses
Page 41 and 42: 37 four level approximation. As the
Page 43 and 44: 39 a) T/N b) t(x) T/N ej2ro|> - I-*
Page 45: 41 A m = e-^sinci^j^t ij = 0 3.17 a
Page 49 and 50: 45 where n is the index of the subs
Page 51 and 52: 47 B Q B mosiac aligned misaligned
Page 53 and 54: 49 4.3 Photoresist Deposition Shipl
Page 55 and 56: 51 Kfl A) 0 . . t .. .'i'S'l'lTtj
Page 57 and 58: 53 A. Substrate Preparation: 1. Soa
Page 59 and 60: 55 modulation is calculated using E
Page 61 and 62: Figure 4-5 Photographs from a scann
Page 63 and 64: 59 was taken as the distance the kn
Page 65 and 66: 61 SAMPLE 1 t IMAX=40.37% SAMPLE 2
Page 67 and 68: 63 670 nm Laser diode Microlens Arr
Page 69 and 70: 65 1 Experimental data n Ideal Gaus
Page 71 and 72: 67 /OwQ\ xCX /TK X~X Fiber Figure 5
Page 73 and 74: 5.4 Conclusions 69 The design, fabr
Page 75 and 76: Appendix A: MATLAB PROGRAM
Page 77 and 78: theta=4*lammm/pi/dmm; z=0:100; dg=d
Page 79 and 80: 75 4" MASK 1" SQUARE CENTER I NOTES
Page 81 and 82: TWP67 V=2mm H=5mm, 77 TWD671 BL1 AM
Page 83 and 84: 15 J.Jahns and A. Huang, "Planar in
Page 85: "J.L. Vossen and W. Kem, Thin Film

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