FY2010 - Oak Ridge National Laboratory
FY2010 - Oak Ridge National Laboratory
FY2010 - Oak Ridge National Laboratory
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05858<br />
Fabrication of Ultrathin Graphite/Graphene Films<br />
Ivan Vlassiouk, Nickolay V. Lavrik, Sheng Dai, and Panos Datskos<br />
Seed Money Fund—<br />
Measurement Science and Systems Engineering Division<br />
Project Description<br />
Since its first introduction in 2004, graphene quickly has become a wonder nanomaterial of unexhausting<br />
interest to many researchers due to its unique properties. Despite graphene`s high potential for unlimited<br />
applications, a reliable source of graphene is still a bottleneck for further development. Recent advances<br />
in chemical vapor deposition (CVD) growth and in chemical techniques based on reduction of graphene<br />
oxide appear promising in providing the routes for the desired high throughput supply of graphene. In this<br />
project we intended to investigate a new, low temperature technique for consistent ultrathin<br />
graphite/graphene membranes fabrication with a large surface area. We relied on graphene synthesis<br />
through a CVD technique. Several approaches were used (different carbon sources/temperature ranges)<br />
with the purpose of understanding whether technologically attractive low temperature CVD graphene<br />
growth could provide graphene that possesses high electronic and thermal conductivities suitable for the<br />
majority of applications.<br />
Mission Relevance<br />
The project outcome will constitute a cornerstone for a successful development of various applications<br />
based on a single layer of graphite. Graphene shows a gigantic potential virtually in every DOE mission<br />
area, such as membranes technologies, energy, computing, and waste treatment. Graphene possesses<br />
unique electronic properties with membranes of this material showing high potential for separation and<br />
filtration. Graphene can be used as a substitute for indium tin oxide in various solar applications,<br />
construction of diverse nanoelectromechanical systems, etc.<br />
Currently we are working on follow up funding from the Defense Advanced Research Projects Agency.<br />
Results and Accomplishments<br />
We have shown that CVD growth of continuous monolayer graphene on copper foils or thin films can be<br />
performed at temperatures as low as 800°C, similar to those for CVD growth on nickel. Despite some<br />
structural defects, such monolayer graphene possesses high electrical and thermal conductivities that<br />
justify its utilization in numerous applications where its thermal management, transparency, and<br />
conductance are desired. Structural disorder, as evaluated from the Raman G-band and D-band ratio<br />
(I G /I D ), gradually increases with lowering the deposition temperature and can be related to a decreasing<br />
size of monocrystalline graphene domains, L a . The corresponding decline in the electrical conductivity is<br />
close to a linear function of L a , while the thermal conductivity (as evaluated from the relative anti-Stokes<br />
intensity) is a much weaker function of L a , with an apparent power dependence K ~ L 1/3 a . The thermal<br />
conductivities measured from the temperature dependence of the G-band position result in almost orderof-magnitude<br />
greater values.<br />
Depending on the disorder degree, CVD graphene shows high thermal (K ~ 1200 WK -1 m -1 , measured<br />
using temperature-induced G band position shift) and electrical (5 10 -4 ohms -1 , for doping levels of<br />
10 12 cm -2 ) conductivities suitable for various applications. Optical absorbance has a nondetectable<br />
dependence on the disorder and equal to 0.023 (pi times fine structure constant) for a single<br />
graphene layer.<br />
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