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Understanding Neutron Radiography Post Exam Reading VIII-Part 2a of 2A

Understanding Neutron Radiography Post Exam Reading VIII-Part 2a of 2A

Understanding Neutron Radiography Post Exam Reading VIII-Part 2a of 2A

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Detector<br />

The diffused p-n junction detector (Fig. 21a) gets its name from its<br />

manufacturing process. A slice <strong>of</strong> p type (electron depleted) silicon or<br />

germanium crystal, with a layer <strong>of</strong> n type (electron rich) impurity (usually<br />

phosphorus) deposited on the surface, is heated to form a p-n junction just<br />

below the surface. The phosphorus may also be painted onto the silicon and<br />

made to diffuse into it by applying heat. Because the n type material has an<br />

excess <strong>of</strong> electrons and the p type has an excess <strong>of</strong> holes (holes may be<br />

thought <strong>of</strong> as unit positive charges), the natural action <strong>of</strong> the combined<br />

materials tends to align the electrons on one side <strong>of</strong> the junction and the<br />

holes on the other. Thus a difference <strong>of</strong> potential is built up across the<br />

junction. By applying an external voltage to the crystal <strong>of</strong> such polarity as to<br />

oppose the natural movement <strong>of</strong> electrons and holes (reverse bias), the<br />

potential barrier across the junction is increased and a depletion region is<br />

produced.<br />

Charlie Chong/ Fion Zhang

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