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(12) PATENT APPLICATION PUBLICATION (21) Application No.272/CHE/2005 A<br />

(19) INDIA<br />

(22) Date <strong>of</strong> filing <strong>of</strong> Application :17/03/2005 (43) Publication Date : 16/03/2007<br />

(54) Title <strong>of</strong> <strong>the</strong> invention : A GLOW DISCHARGE PLASMA BASED CVD TECHNOLOGY FOR THE<br />

PRODUCTION OF NI COATINGS AND COMPOSITE COATINGS OF CRN AND NI USING METALLO-<br />

ORGANIC PRECURRORS OF CR AND OF NI<br />

(51) International classification :C23C<br />

16/00<br />

(31) Priority Document No :NA<br />

(32) Priority Date :NA<br />

(33) Name <strong>of</strong> priority country :NA<br />

(86) International Application No :NA<br />

Filing Date<br />

:NA<br />

(87) International Publication No : NA<br />

(61) Patent <strong>of</strong> Addition to Application :NA<br />

Number<br />

Filing Date<br />

:NA<br />

(62) Divisional to to Application Number :NA<br />

Filing Date<br />

:NA<br />

(71)Name <strong>of</strong> Applicant :<br />

1)DEPT OF CHEMISTRY AND LOYOLA<br />

INSTITUTE OF FRONTIER ENERGY, LOYOLA<br />

COLLEGE<br />

Address <strong>of</strong> Applicant :LOYOLA<br />

COLLEGE,CHENNAI-600 034 Tamil Nadu India<br />

(72)Name <strong>of</strong> Inventor :<br />

1)PETER ANTONY PREMKUMAR<br />

2)KARACHALACHEREVU SEETHARAMIAH<br />

NAGARAJA<br />

3)PARASURAMAN KUPPUSAMI<br />

4)ARUP DASGUPTA<br />

5)CHELLANDAR MALLIKA<br />

6)VINJAMOOR SESHADRI RAGHUNATHAN<br />

7)BALDEV RAJ<br />

No <strong>of</strong> Pages : 30 No <strong>of</strong> Claims : 8<br />

(57) Abstract :<br />

The present invention relates to plasma based CYD(PAMOCYD) technology for Ni coatings and<br />

composite coatings <strong>of</strong>CrN and Ni using metallo-organic precursors <strong>of</strong>Ni or Ni and Cr precursor<br />

composition comprising bis (acetylacetone-ethylenediamine) nickel(II), Ni[(acac)2en] arxl<br />

chromium(III) acetylacetonate, Cr(acac)3. The invention also relates to a process for single step<br />

vapourisation <strong>of</strong> <strong>the</strong> metallo-organic- precursors and simultaneous deposition <strong>of</strong> nickel and<br />

chromium nitride coating on conducting, non conducting and semi-conducting substrates by<br />

cracking <strong>the</strong> vapours <strong>of</strong> precursor Icomposition in a direct current glow discharge nitrogen plasma<br />

under sub-atmospheric pressure.<br />

The Patent Office Journal 16/03/2007 5434

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