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(12) PATENT APPLICATION PUBLICATION (21) Application No.01373/DELNP/2004 A<br />

(19) INDIA<br />

(22) Date <strong>of</strong> filing <strong>of</strong> Application :21/05/2004 (43) Publication Date : 16/03/2007<br />

(54) Title <strong>of</strong> <strong>the</strong> invention : MAGNETRON SPUTTERING DEVICE<br />

(51) International classification :C23C 14/35 (71)Name <strong>of</strong> Applicant :<br />

(31) Priority Document No :0126721.0 1)DERMOT PATRICK MONAGHAN<br />

(32) Priority Date :07/11/2001 Address <strong>of</strong> Applicant :227 BLACKBURN ROAD, WHEELTON, NEAR<br />

(33) Name <strong>of</strong> priority country :U.K.<br />

CHORLEY, LANCASHIRE PR6 8KY, ENGLAND. U.K.<br />

(86) International Application No<br />

:PCT/GB02/05046 2)VIATOR BELLIDO-GONZALEZ<br />

Filing Date<br />

:07/11/2002 (72)Name <strong>of</strong> Inventor :<br />

(87) International Publication No :WO 03/041113 1)VIATOR BELLIDO-GONZALEZ<br />

(61) Patent <strong>of</strong> Addition to Application Number :NA<br />

2)DERMOT PATRICK MONAGHAN<br />

Filing Date<br />

:NA<br />

(62) Divisional to to Application Number<br />

:NA<br />

Filing Date<br />

:NA<br />

No <strong>of</strong> Pages : 18 No <strong>of</strong> Claims : 24<br />

(57) Abstract :<br />

A target arrangement for use within a vacuum sputtering zone comprising: a primary target (1) comprising material to be sputtered and an auxiliary target (2)<br />

<strong>of</strong> ferromagnetic material, <strong>the</strong> targets being located relative to one ano<strong>the</strong>r such that upon application <strong>of</strong> a magnetic field across <strong>the</strong> surface <strong>of</strong> <strong>the</strong> targets, <strong>the</strong><br />

magnetic field over <strong>the</strong> primary target is confined into an area <strong>of</strong> high homogeneous magnetic field strength substantially parallel to <strong>the</strong> surface <strong>of</strong> <strong>the</strong><br />

primary target, to achieve uniform erosion across said area <strong>of</strong> target during sputtering. Preferably <strong>the</strong> primary target and auxiliary target are spaced apart by a<br />

gap (12), to enhance <strong>the</strong> confinement <strong>of</strong> magnetic field. The auxiliary target may have a surface which is raised beyond a surface <strong>of</strong> <strong>the</strong> primary target. The<br />

primary target may be <strong>of</strong> ferromagnetic or non-magnetic material.<br />

The Patent Office Journal 16/03/2007 5666

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