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X-Ray Fluorescence Analytical Techniques - CNSTN : Centre ...

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20.<br />

3<br />

ϕcrit<br />

= ρ . (III.1)<br />

E<br />

For example, for incident Mo Kα (17.5 keV) radiation and quartz glass as reflector, the<br />

critical angle calculates as 1.7 mrad (= 0.1°).<br />

The preferred types of samples are either aqueous or acidic solutions (Figure III.3).<br />

With special sample preparation techniques, the pg/g concentration level can be reached.<br />

There are no corrections for absorption or secondary excitation necessary due to the sample<br />

formation in a very thin layer. In any case the addition of an internal standard of known<br />

concentration is essential for the quantification (typical elements, preferably not present in the<br />

sample are Co, Ga, Ge, Y …). Rewardingly, the calibration curves are linear over several<br />

orders of magnitude and therefore the calculations for converting the measured intensities to<br />

concentrations are simple and can be based on experimentally or theoretically determined<br />

relative sensitivity curves Srel(Z) as a function of the atomic number Z for all elements in<br />

respect to the internal standard element. The concentration wi of an element i can be<br />

calculated by:<br />

n 1<br />

w = w . (III.2)<br />

i<br />

i<br />

n st Srel<br />

st<br />

Note that nst and wst are the intensity and the concentration of the internal standard element.<br />

Figure III.3: Spectrum of a 3 µL mineral water sample, spiked with 1 ng/µL Ga as<br />

internal standard element. Excitation in TXRF geometry with a multilayer<br />

monochromator by a Mo X-ray tube (50 kV, 10 mA, 1000 s measuring time).<br />

The angular dependence of intensities in the regime of total reflection can be used to<br />

investigate surface impurities, thin near-surface layers, and even molecules absorbed on flat<br />

surfaces. From these angle-dependent intensity profiles the composition, thickness and<br />

density of layers can be obtained. It is the low penetration depth of the primary beam at total<br />

reflection that enables also the non-destructive in-depth examination of concentration profiles<br />

in the range of 1 – 500 nm.

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