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X-Ray Fluorescence Analytical Techniques - CNSTN : Centre ...

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Figure III.5: Measured primary spectrum of a fine-focus Mo diffraction X-ray tube (45<br />

kV acceleration voltage) as typically used for TXRF. The characteristic Mo<br />

Kα and Mo Kβ lines are superimposed on the Bremsstrahlung background.<br />

Monochromators also can modify the primary radiation and they are usually set to the<br />

angry of the most intense characteristic line of the anode material. For a Mo-anode X-ray tube<br />

Mo Kα or for a W-anode W-Lβ are selected, but a part of the continuum can be<br />

monochromatized as well. Commonly used crystal monochromators have the disadvantage of<br />

a very narrow energy band transmitted (usually in the range of few electron volts), whereas<br />

synthetic multilayer structures are characterized by higher ∆E/E and reflectivities of up to 75<br />

% for premium quality materials.<br />

IV.2 Sample Reflectors<br />

For the trace analysis of granular residues, a carrier with high reflectivity that serves as<br />

a totally reflecting sample support is required. Therefore, the mean roughness should be in the<br />

range of only a few nanometers and the overall flatness should be typically be less than λ/20<br />

(λ = 589 nm, the mean wavelength of the visible light). Furthermore, reflectors should be free<br />

of impurities so that the black spectrum should be free from contamination peaks and the<br />

carrier material must not have fluorescence peaks in the spectral region of interest. In<br />

addition, the carrier material must be chemically inert (also against strong chemicals, which<br />

are often used for the sample preparation), easy to be cleaned for repeated use.<br />

Some of the reflector materials that are in use are: quartz glass (most common), silicon,<br />

germanium, glassy carbon, niobium, boron nitride and (as cheapest material) Plexiglas. The<br />

requirements for the reflector are: no interfering fluorescence or diffraction lines, high purity,<br />

chemical resistance, hardness, machineability for polishing and an acceptable price. The<br />

surface must be flat and the mean roughness in the range of nanometers. Usually, they are<br />

disk shaped, with 30 mm diameter and 3 – 5 mm thickness, but also squares of 30 mm side<br />

length and rectangular types are in use.<br />

IV.3 Detectors<br />

Total reflection XRF is an energy dispersive XRF method, the radiation is measured<br />

mainly by Si(Li) detectors. A good detector offers a high energy resolution [Full Width at<br />

Half Maximum (FWHM) in the range of 140 eV at 5.89 keV], intrinsic efficiency close to 1<br />

for the X-ray lines of interest, symmetric peak shapes, and low contribution to the<br />

background. Primarily, incomplete charge collection at the electrodes leads to low-energy<br />

tailing. The detector escape effect creates escape peaks and thus an increased background in<br />

certain spectral regions. An inherent advantage of semiconductor detectors is the possibility of<br />

bringing the detector crystal very close to the sample, which results in a large solid angle.<br />

Light elements emit fluorescent lines in the range from 100 to 1000 eV. The usually used Be<br />

entrance window would completely absorb them, so new window materials, offering better<br />

transmission characteristics, are used instead.<br />

V. Quantification

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