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Epitaxy and interface defects

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Measurement of critical thickness<br />

Critical thickness (Å)<br />

Measurement of critical thickness in the Si 1 − x Ge x /Si (001) system<br />

for different growth temperatures vs. the prediction of the Matthews–Blakeslee model<br />

[Hull:94]<br />

hsl 2007 – Structure of imperfect materials – <strong>Epitaxy</strong> <strong>and</strong> <strong>interface</strong> <strong>defects</strong><br />

Germanium fraction x<br />

Theory<br />

550 °C<br />

750 °C<br />

900 °C<br />

18

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