Coater/Developer Evolution or Revolution? - Sematech
Coater/Developer Evolution or Revolution? - Sematech
Coater/Developer Evolution or Revolution? - Sematech
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TEL FIRM Impact on Pattern Collapse<br />
Coat freeze<br />
LLE L/S Patterning<br />
DIW Rinse Surfactant Rinse<br />
~170 defects<br />
due to pattern collapse<br />
~0 defects<br />
due to pattern collapse<br />
TEL FIRM has demonstrated effectiveness across multiple LLE<br />
processes.<br />
Data courtesy of IMEC<br />
Reference: Towards 26nm hp: Advances in Litho<br />
Process Litho; P. Wong
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