Coater/Developer Evolution or Revolution? - Sematech

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Summary • DP processes are chosen by technology performance, customer device / layer type, and integration strategy, creating a complex space • TEL’s objective is to be a partner, regardless of the DP technology used, in helping our customers to: – Establish world class process performance – Achieve the highest productivity with lowest process cost
• TEL: Acknowledgements – S. Shimura, T. Kawasaki, S. Natori, A. Hara, K. Hontake, T. Niwa, C. Fonseca, K. Nafus, H. Yaegashi • IMEC – P. Wong, R. Gronheid
Page 1 and 2: Double Patterning Coater/Developer
Page 3 and 4: i-line KrF / ArF Immersion Evolutio
Page 5 and 6: 1 st Exposure 1 st Etch 2 nd Exposu
Page 7 and 8: Key Coater/Developer DP Concerns Pr
Page 9 and 10: PR Line Slimming & LWR Reduction Po
Page 11 and 12: TEL FIRM Impact on Pattern Collapse
Page 13 and 14: Key Coater/Developer DP Concerns Pr
Page 15 and 16: Process Costs: Dual‐Tone Developm
Page 17 and 18: Tool Productivity: LITHIUS Pro V OE
Page 19: Tool Productivity: Wafers Per Day (

Coater/Developer Evolution or Revolution? - Sematech

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