Coater/Developer Evolution or Revolution? - Sematech
Coater/Developer Evolution or Revolution? - Sematech
Coater/Developer Evolution or Revolution? - Sematech
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PR Line Slimming & LWR Reduction<br />
Post<br />
Litho<br />
Clean Track<br />
Pro V<br />
PR Wet<br />
Slimming<br />
Process<br />
PR LWR<br />
Smoothing<br />
Process<br />
40nm hp<br />
CDU = 1.9nm<br />
LWR = 4.3nm<br />
New PR<br />
Process<br />
LWR data samples made by IMEC<br />
BARC<br />
Trim<br />
TACTRAS<br />
VIGUS<br />
SiO2<br />
Depo<br />
TELINDY<br />
SiO2<br />
Etch‐back<br />
C<strong>or</strong>e Strip<br />
TACTRAS<br />
VIGUS<br />
Initial Pattern Post Slimming<br />
CD=49.9nm<br />
LWR=4.9nm<br />
H=92.5nm<br />
H/M<br />
Etch<br />
TACTRAS<br />
VIGUS<br />
CD=32.8nm (-17.1nm)<br />
LWR=4.0nm (-0.9nm)<br />
H=83.3nm (-9.2nm)<br />
Initial Pattern Post Smoothing<br />
LWR3s: 3.1nm LWR3s: 2.7nm<br />
20nm hp<br />
CDU = 2.0nm<br />
LWR = 2.5nm
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