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165-GHz Transceiver in SiGe Technology - Computer Engineering ...

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1100 IEEE JOURNAL OF SOLID-STATE CIRCUITS, VOL. 43, NO. 5, MAY 2008<br />

[27] P. Chevalier, B. Barbalat, L. Rubaldo, B. Vandelle, D. Dutartre, P.<br />

Bouillon, T. Jagueneau, C. Richard, F. Sagu<strong>in</strong>, A. Marga<strong>in</strong>, and A.<br />

Chantre, “300 <strong>GHz</strong> fmax self-aligned <strong>SiGe</strong>c HBT optimized towards<br />

CMOS compatiblity,” <strong>in</strong> Proc. 2005 Bipolar/BiCMOS Circuits<br />

Technol. Meet<strong>in</strong>g, Santa Barbara, CA, Oct. 2005, pp. 120–123.<br />

Ekater<strong>in</strong>a Lask<strong>in</strong> (S’04) received the B.A.Sc.<br />

(Hons.) degree <strong>in</strong> computer eng<strong>in</strong>eer<strong>in</strong>g and the<br />

M.A.Sc. degree <strong>in</strong> electrical eng<strong>in</strong>eer<strong>in</strong>g from<br />

the University of Toronto, Toronto, ON, Canada,<br />

<strong>in</strong> 2004 and 2006, respectively. She is currently<br />

work<strong>in</strong>g toward the Ph.D. degree <strong>in</strong> the Department<br />

of Electrical and <strong>Computer</strong> Eng<strong>in</strong>eer<strong>in</strong>g, University<br />

of Toronto.<br />

Her research <strong>in</strong>terests <strong>in</strong>clude the design of highspeed<br />

and millimeter-wave <strong>in</strong>tegrated circuits, with<br />

a focus on mm-wave imag<strong>in</strong>g systems. In 2006, she<br />

was on a 6-month <strong>in</strong>ternship with the IBM T. J. Watson Research Center, Yorktown<br />

Heights, NY.<br />

Ms. Lask<strong>in</strong> was a University of Toronto Scholar from 2000 to 2004. She<br />

received the National Science and Eng<strong>in</strong>eer<strong>in</strong>g Research Counsel of Canada<br />

(NSERC) undergraduate student research award <strong>in</strong> <strong>in</strong>dustry and university <strong>in</strong><br />

2002 and 2003. She was the recipient of the NSERC Postgraduate Scholarship<br />

and currently holds the NSERC Canada Graduate Scholarship. At the 2008<br />

IEEE ISSCC, she received the Beatrice W<strong>in</strong>ner award for editorial excellence.<br />

Pascal Chevalier (M’06) received the eng<strong>in</strong>eer<strong>in</strong>g<br />

degree <strong>in</strong> science of materials from the University<br />

School of Eng<strong>in</strong>eers of Lille (Polytech’Lille),<br />

France, <strong>in</strong> 1994 and the Ph.D. degree <strong>in</strong> electronics<br />

from the University of Lille <strong>in</strong> 1998. His doctoral<br />

research, done at the Institute of Electronics, Microelectronics<br />

and Nanotechnologies, Villeneuve<br />

d’Ascq (France), dealt with the development of<br />

100-nm AlInAs/GaInAs InP-based HEMT technologies<br />

for low-noise and power millimeter-wave<br />

amplification.<br />

In 1999, he jo<strong>in</strong>ed the <strong>Technology</strong> R&D department of Alcatel Microelectronics,<br />

Oudenaarde (Belgian Flanders) as Device and Integration Eng<strong>in</strong>eer on<br />

0.35-"m Si BiCMOS technology. He was Project Leader for the development<br />

of 0.35-"m <strong>SiGe</strong> BiCMOS technologies, developed <strong>in</strong> cooperation with the Interuniversity<br />

MicroElectronics Center, Leuven, Belgium. In 2002, he jo<strong>in</strong>ed the<br />

Analog & RF Process <strong>Technology</strong> Development Group of STMicroelectronics,<br />

Crolles, France, to develop high-speed self-aligned Si/<strong>SiGe</strong>:C HBTs for 130-nm<br />

millimeter-wave BiCMOS technology. He is currently <strong>in</strong> charge of the development<br />

of advanced devices for RF and millimeter-wave applications. He has<br />

authored or co-authored more than 80 technical papers and holds several patents.<br />

Dr. Chevalier belongs to the wireless work<strong>in</strong>g group of the International <strong>Technology</strong><br />

Roadmap for Semiconductors and is the process technology subcommittee<br />

chair for the IEEE Bipolar/BiCMOS Circuits and <strong>Technology</strong> Meet<strong>in</strong>g.<br />

Ala<strong>in</strong> Chantre (M’91–SM’97) was born <strong>in</strong> Reims,<br />

France, <strong>in</strong> 1953. He received the eng<strong>in</strong>eer<strong>in</strong>g degree<br />

<strong>in</strong> physics from the Institut National des Sciences<br />

Appliquées de Lyon, France, <strong>in</strong> 1976, and the Ph.D.<br />

degree from the Université Scientifique et Médicale<br />

de Grenoble, France, <strong>in</strong> 1979. His doctoral research<br />

concerned deep-level optical spectroscopy (DLOS)<br />

<strong>in</strong> GaAs.<br />

He jo<strong>in</strong>ed the Centre National d’Etudes des Télécommunications<br />

(CNET), Grenoble, <strong>in</strong> 1979. He<br />

worked from 1979 to 1985 at the CNET Grenoble<br />

laboratory and dur<strong>in</strong>g 1985–1986 at AT&T Bell Laboratories, Murray Hill, NJ,<br />

on deep level defects <strong>in</strong> silicon. From 1986 to 1992, he was <strong>in</strong> charge of a group<br />

work<strong>in</strong>g on the characterization of advanced silicon processes and devices.<br />

From 1993 to 1999, he has been work<strong>in</strong>g with<strong>in</strong> the GRESSI consortium<br />

between France Telecom CNET and CEA-LETI, as head of a group <strong>in</strong>volved<br />

<strong>in</strong> the development of advanced bipolar devices for submicron BiCMOS<br />

technologies. He jo<strong>in</strong>ed STMicroelectronics, Crolles, <strong>in</strong> 2000, where he is<br />

currently manag<strong>in</strong>g the development of advanced <strong>SiGe</strong> bipolar devices and<br />

technology for RF and optical communications applications. He has published<br />

over 130 technical papers related to his research, and holds 20 patents.<br />

Bernard Sautreuil received the Eng<strong>in</strong>eer degree <strong>in</strong><br />

material physics from INSA Lyon, France, <strong>in</strong> 1979.<br />

He completed his thesis on Ge solar cells for multicolor<br />

systems <strong>in</strong> 1982.<br />

In 1985, he jo<strong>in</strong>ed Thomson Semiconductor<br />

(which became STMicroelectronics <strong>in</strong> 1987), <strong>in</strong><br />

St. Egreve, France, where he acted successively<br />

as a process, ma<strong>in</strong>tenance, and device eng<strong>in</strong>eer.<br />

In 1991, he jo<strong>in</strong>ed the STMicroelectronics Crolles<br />

metallization process group and then moved to<br />

Metal-Implant management, followed by the photo<br />

and etch group, <strong>in</strong>clud<strong>in</strong>g R&D. In 1999, he jo<strong>in</strong>ed the R&D analog and RF<br />

technology group as Assistant Manager for BiCMOS <strong>Technology</strong> and Passive<br />

components development. S<strong>in</strong>ce 2004, he has worked as an <strong>in</strong>terface for<br />

STMicroelectronics BiCMOS RF and mixed-signal customers.<br />

Sor<strong>in</strong> P. Vo<strong>in</strong>igescu (M’90–SM’02) received the<br />

M.Sc. degree <strong>in</strong> electronics from the Polytechnic<br />

Institute of Bucharest, Romania, <strong>in</strong> 1984, and the<br />

Ph.D. degree <strong>in</strong> electrical and computer eng<strong>in</strong>eer<strong>in</strong>g<br />

from the University of Toronto, Toronto, ON,<br />

Canada, <strong>in</strong> 1994.<br />

From 1984 to 1991, he worked <strong>in</strong> R&D and<br />

academia <strong>in</strong> Bucharest, where he designed and<br />

lectured on microwave semiconductor devices and<br />

<strong>in</strong>tegrated circuits. Between 1994 and 2002, he was<br />

with Nortel Networks and Quake Technologies <strong>in</strong><br />

Ottawa, Canada, where he was responsible for projects <strong>in</strong> high-frequency<br />

characterization and statistical scalable compact model development for Si,<br />

<strong>SiGe</strong>, and III-V devices. He later conducted research on wireless and optical<br />

fiber build<strong>in</strong>g blocks and transceivers <strong>in</strong> these technologies. In 2002 he jo<strong>in</strong>ed<br />

the University of Toronto, where he is a full Professor. He has authored<br />

or co-authored over 100 refereed and <strong>in</strong>vited technical papers spann<strong>in</strong>g the<br />

simulation, model<strong>in</strong>g, design, and fabrication of high frequency semiconductor<br />

devices and circuits. His research and teach<strong>in</strong>g <strong>in</strong>terests focus on nanoscale<br />

semiconductor devices and their application <strong>in</strong> <strong>in</strong>tegrated circuits at frequencies<br />

beyond 200 <strong>GHz</strong>.<br />

Dr. Vo<strong>in</strong>igescu received NORTEL’s President Award for Innovation <strong>in</strong> 1996<br />

and is a member of the TPCs of the IEEE CSICS and BCTM. He is a co-recipient<br />

of the Best Paper Award at the 2001 IEEE CICC and at the 2005 IEEE CSICS,<br />

and of the Beatrice W<strong>in</strong>ner Award at the 2008 IEEE ISSCC. His students have<br />

won Best Student Paper Awards at the 2004 IEEE VLSI Circuits Symposium,<br />

the 2006 SiRF Meet<strong>in</strong>g, 2006 RFIC Symposium and 2006 BCTM.

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