W0 2011/000721 A1 I||||||||||||||||||||||||||||||||||||||||||||||||||||||||| - Questel

wherein R 2 , Q and n have the same meaning as above disclosed.
In particular, in a preferred embodiment, said J dendrimer based on 2,2'-
bis(methoxyol)propanoic (bis-MPA) is a first or second generation or higher
generation bis(methoxyol)propanoic (bis-MPA) based dendrimers (see, for
instance, at Fig. 12).
According to the above, a preferred compound within formula (Ib) is compound
15 below reported
prepared according to the following Example 3, wherein R 1 is H, R 2 is methoxy
H
(-OCH 3 ), R is H, n is 1, Q is — — and it is linked to Y, which is a succinic
acid residue and the J scaffold is a third generation 2,2'-
bis(methoxyol)propanoic (bis-MPA) based dendrimer.
Alternatively, the dendrimer scaffold J may be a poly(amidoamine) (PAMAM)
based dendrimer (see, for instance, at Fig. 13).
15