Loke et al., 2D to 3D MOS Technology Evolution for Circuit Designers
Loke et al., 2D to 3D MOS Technology Evolution for Circuit Designers
Loke et al., 2D to 3D MOS Technology Evolution for Circuit Designers
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Mask – Optic<strong>al</strong> Proximity Correction<br />
• Sharp features are lost because diffraction attenuates higher<br />
spati<strong>al</strong> frequencies (mask behaving as low-pass optic<strong>al</strong> filter)<br />
• Compensate <strong>for</strong> diffraction effects when feature sizes