SEC-400series - Shavo Technologies

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39 LIQUID Measurement principles sCooling measurement method The flow rate sensor in the LF/LV series of fine mass flow controllers for liquids consists of an electronic cooling element (Peltier element) that is in contact with a capillary tube, as well as several temperature detection elements. When the liquid is flowing, the sensor detects the temperature rise (∆T) corresponding to the flow rate and displays it as a flow rate. Unlike methods where heat is added, this cooling method enables flow rate measurement of liquids with low boiling points. It also prevents problems with interference due to the influence of secondary discharge (vaporization) and makes accurate flow rate measurements possible. Temperature (°C) Liquid Stainless steel capillary tube Ts ∆T Principle of vaporization sInjection method Pressure Solid Temperature distribution in sensor area Triple point Electronic cooling element (Peltier element) When liquid is flowing Liquid When liquid is not flowing The following list covers the major steps involved in vaporizing a liquid source and supplying it to the process chamber. 1. The liquid source's flow rate is measured, and the amount of liquid is feedback controlled by the valve. 2. The liquid is instantaneously and completely vaporized. 3. The gas is released without being allowed to condense back into its liquid form. Vaporization systems that use the injection method sequentially carry out steps 1, 2, and 3 listed above. The VC series units measure the liquid flow of the liquid source using a mass flow meter, and do not use a carrier gas. The MI/MV series units use a mass flow meter for measurement, and feature a mass flow controller that introduces a carrier gas into the unit to vaporize the liquid source. Temperature The graph above shows the different possible states of matter. There are two ways to get from a liquid to a gaseous state. The first method involves increasing the temperature while holding the pressure steady, as indicated by the arrow with the broken line ( ). This method is commonly used in everyday settings—to boil water and convert it to steam, for example. Heating a liquid takes time, however, which makes rapid vaporization difficult. On the other hand, one can also heat the liquid in advance and then abruptly reduce the pressure, as illustrated by the arrow with the solid line ( ). The pressure in the vaporization section of the injector can be reduced instantaneously, and this makes it possible to vaporize a liquid source instantaneously. sGas and liquid mixture method Gas This is the vaporization method used in the MI/MV series. Since the pressure on the carrier gas is higher at the front of the nozzle inside the injector, it can be heated efficiently. The liquid source and the heated carrier gas are mixed together in the gas/liquid mixing area in the front of the nozzle, and the pressure is reduced as they pass through the nozzle, which vaporizes the mixture. Vaporization efficiency is higher than with traditional vaporization methods. When this method is used, larger flows can be generated, and the generation temperature can be reduced. Gas in Mixed gas and liquid out Liquid in sStructure/Operating principle The LV series of mass flow controllers are similar to the LF series of mass flow controllers, but also have a piezo actuator valve and an internal comparison control circuit. They compare the flow rate setting signal and the flow rate output signal and automatically control the valve aperture so that the two signals will match. Since they use a feedback control system, there are no flow rate variations as a result of external factors, and stable, accurate control is possible. The use of a piezo actuator valve, which is both stable and does not generate heat, as the control valve makes these units ideal for flow control of liquids with low boiling points. sOptimal vaporization methods for different liquids In semiconductor devices, which continue to require greater integration and detail, a variety of liquid sources are used to accentuate the characteristics of the films created. HORIBA STEC offers vaporization systems that are optimized to make the most of the characteristics of the various liquid sources used in today's cutting-edge processes. High-k TDEAH TEMAH TDMAS TAETO Low-k DMDMOS HMDSO 4MS Inlet TMCTS The other DMDMOS BTBAS HMDSO TEOS 4MS TEPO TMCIS TEB TiCl4 IPA H2O Flow rate sensor Drive power source Flow rate output signal Flow rate setting signal Correction circuit Amplification circuit Sensor circuit MV MV VC Comparison control circuit Valve drive circuit Piezo actuator Flow rate control valve Peltier element MV MV MV 0.05 0.1 0.5 1 g/min VC VC MV VC VC VC Metal diaphragm Outlet 1 3 5 g/min VC MV VC MV VC MV 0.1 1 5 20 g/min
Basic flow sLSC series Purge 1/4" VCR type male Source 1/4" VCR type male sLU series N2 1/4" VCR type male He 1/4" VCR type male Air pressure valve F Valve Filter Filter Tank Sample system configuration Automatic supply F <strong>SEC</strong> Mass flow controller Drain 1/4" VCR type female Valve P P Regulator Outlet 3/8" VCR type male P P Pressure sensor P P.S Air pressure valve Pressure switch P Load cell sTL series Carrier gas inlet 1/4" VCR type male Purge liquid inlet 1/8" VCR type male Liquid source inlet 1/8" VCR type male Drain 1/8" VCR type male <strong>SEC</strong> VAPO Mass flow controller Air pressure valve Liquid mass flow controller Sample 2 G P.S P.S LU-A100 LSC VC system MI system MV system TL system The LU-A100 auto-recharge system safely and efficiently supplies the liquid source to each type of vaporization system. Manual valve He out Source in Tank P Check valve Liquid Source Vaporization Control Systems 40 LV Sample out 1/4" Swagelok type Sample 1 1/4" Swagelok type Vaporizer Outlet 3/5" VCR type male Vacuum 1/4" VCR type male Exhaust 1/4" VCR type male Source 1 1/4" VCR type male Source 2 1/4" VCR type male Source 3 1/4" VCR type male Source 4 1/4" VCR type male Source 5 1/4" VCR type male Source 6 1/4" VCR type male Drain 2 1/4" VCR type male Drain 1 1/4" VCR type male
Page 1 and 2: Liquid Source Vaporization Technolo
Page 3 and 4: sWhat is a mass flow controller? sD
Page 5 and 6: sLaminar flow element bypass The se
Page 7 and 8: SEC-Z500 series Cutting edge models
Page 9 and 10: SEC-V100D series SEC- mass flow ( c
Page 11 and 12: Connecting digital mass flow contro
Page 13 and 14: SEC-7300 series The series that bec
Page 15 and 16: High-speed response with ultra quic
Page 17 and 18: SEC-G100A series World’s smallest
Page 19 and 20: Reduced footprints Currently, 39 mm
Page 21 and 22: SEC-8000/2000 series SEC- SEF- mass
Page 23 and 24: Connecting analog mass flow control
Page 25 and 26: MFT-20 Mass flow checker When there
Page 27 and 28: Choosing the appropriate mass flow
Page 29 and 30: Accessory dimensions sPAC-S6 192 sP
Page 31 and 32: UR-7300 series The UR-7300 series a
Page 33 and 34: UR-7300 series sFast, accurate pres
Page 35 and 36: Dimensions (mm) sUR-7340/7350 sGR-1
Page 37 and 38: LF/ LV series Featuring the world's
Page 39: LF/LV series Model Flow Range (g/mi
Page 43 and 44: Micropole System The world’s smal
Page 45 and 46: Capacitance Manometers; VG Series s
Page 47 and 48: FG-100 series Efficient gas measure
Page 49 and 50: FTIR Gas Analyzers: FG-100 Series s
Page 51 and 52: External dimensions sLF/LV series H
Page 53 and 54: HORIBA, Ltd. The HORIBA brand is kn
Page 55 and 56: Principal branches overseas TAIWAN

SEC-400series - Shavo Technologies

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