CH1-silicon wafer & Si epitaxy - KTH
CH1-silicon wafer & Si epitaxy - KTH
CH1-silicon wafer & Si epitaxy - KTH
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- wafer
- epitaxy
- www.it.kth.se
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2B1242 SPRING 2006<br />
Applications of <strong>Si</strong> <strong>epitaxy</strong><br />
HT <strong>epitaxy</strong>:<br />
p- epi on p+ bulk in CMOS for suppression of latch-up<br />
n- on n+ buried collector layer in bipolar devices for reduced series resistance<br />
(single- or double epi):<br />
p +<br />
n -<br />
P plug<br />
n+ buried layer<br />
LOCOS isolation<br />
Mikael Östling <strong>KTH</strong><br />
p +<br />
Grahn ASM User meeting’99<br />
Problem: Pattern shift during n-epi on buried layer<br />
Important to control for <strong>wafer</strong> alignment<br />
on buried layer!<br />
(Chang p.123)