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uuauu 008 100210s2009 nyua fob 001 0 eng - McGraw-Hill ...

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007 cr cn ---<strong>uuauu</strong><br />

<strong>008</strong> 090821s2009 nyu <strong>fob</strong> <strong>001</strong> 0 <strong>eng</strong> d<br />

010 $z 2009002187<br />

020 $a0071664793<br />

020 $z9780071549189 (print)<br />

020 $z0071549188 (print)<br />

035 $a(Sirsi) a244319<br />

050 4$aTK7872.M3$bE987 2009<br />

082 04$a621.3815/31$222<br />

245 00$aExtreme ultraviolet lithography$h[electronic resource] /$cBanqiu Wu, Ajay Kumar, editors.<br />

260 $aNew York :$b<strong>McGraw</strong>-<strong>Hill</strong>,$c[2009]<br />

300 $a1 electronic text (xiv, 465 p.) :$bill.<br />

490 1 $a<strong>McGraw</strong>-<strong>Hill</strong>'s AccessEngineering<br />

588 $aDescription based on cover image and table of contents, viewed on August 20, 2009.<br />

500 $aPrint version c2009.<br />

504 $aIncludes bibliographical references and index.<br />

530 $aAlso issued in print and PDF version.<br />

650 0$aExtreme ultraviolet lithography.<br />

650 0$aIntegrated circuits$xMasks.<br />

650 0$aIntegrated circuits$xDesign and construction.<br />

655 0$aElectronic books.<br />

655 0$aInternet resources.<br />

700 1 $aWu, Banqiu.<br />

700 1 $aKumar, Ajay,$d1962-<br />

700 1 $aEynon, Benjamin G.<br />

700 1 $aNaulleau, Patrick.<br />

700 1 $aRichardson, Martin.<br />

700 1 $aLa Fontaine, Bruno.<br />

700 1 $aYulin, Sergiy.<br />

700 1 $aSilver, Richard M.<br />

700 1 $aVladar, Andras E.<br />

700 1 $aKamberian, Henry.<br />

740 02$aExposure system.<br />

740 02$aEUV sources.<br />

740 02$aEUV optics.<br />

740 02$aMultilayer interference coatings for EUVL.<br />

740 02$aEUV metrology.<br />

740 02$aEUV photoresist.<br />

740 02$aEUVL masks.<br />

830 0$a<strong>McGraw</strong>-<strong>Hill</strong>'s AccessEngineering.<br />

856 40$uhttp://access<strong>eng</strong>ineeringlibrary.com/browse/extreme-ultraviolet-lithography$zSubscription<br />

required<br />

949 $aTK 7872 .M3 E987$wLC$c1$i244319-2<strong>001</strong>$d12/30/2011$lMAIN$mMGH$q4$rY$sY$tWEB$u8/21/2009$xENG<br />

997 $a(c)2009 Cassidy Cataloguing Services, Inc.<br />

000 02196cam 2200529 a 4500<br />

<strong>001</strong> ccn00244320<br />

006 m f d<br />

007 cr cn ---<strong>uuauu</strong><br />

<strong>008</strong> 090821s2009 <strong>nyua</strong> <strong>fob</strong> <strong>001</strong> 0 <strong>eng</strong> d<br />

010 $z 2<strong>008</strong>055346<br />

020 $a0071700366<br />

020 $z9780071623834 (print)<br />

020 $z0071623833 (print)<br />

035 $a(Sirsi) a244320<br />

050 4$aTS183$b.M4613 2009<br />

082 04$a670.285$222<br />

130 0 $aMES.$lEnglish.<br />

245 10$aManufacturing execution systems$h[electronic resource] :$boptimal design, planning, and<br />

deployment /$cHeiko Meyer, editor ; Franz Fuchs, contributing author ; Klaus Thiel,<br />

contributing author.<br />

260 $aNew York :$b<strong>McGraw</strong>-<strong>Hill</strong>,$c[2009]<br />

300 $a1 electronic text (xix, 248 p.) :$bill.<br />

490 1 $a<strong>McGraw</strong>-<strong>Hill</strong>'s AccessEngineering<br />

588 $aDescription based on cover image and table of contents, viewed on August 20, 2009.<br />

500 $aPrint version c2009.

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