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Capítulo 3 different microwave power levels, namely: 100, 200, 250, 300, 600 and 1000 W. At a low power levels, the contaminant concentration at the reactor outlet increases with increasing concentration introduced in the plasma; above 300 W, however, the supplied energy suffices to maintain a virtually zero output concentration. In any case, the increase in output concentration with increase in the amount of CCl4 present in the plasma provides no measure of the destructive efficiency of the plasma as it implies the processing of an increased amount of contaminant per time unit. To this end, one should use the percent destruction and removal of CCl4, %DRE, as calculated from the expression (2) [17]: ⎛Win −W ⎞ out % DRE = ⎜ ⎟× 100 ⎝ Win ⎠ (2) where Win is the mass of waste inserted and Wout that remaining after the plasma treatment. As can be seen in figure 3.6, %DRE increases with increasing initial concentration of CCl4, which was not apparent from the variation of the CCl4 concentration at the reactor outlet. A similar result was previously obtained by Yamamoto et al. [18] that can be ascribed to the presence of a secondary destruction pathway involving collisions between chlorine and copper radicals formed in fragmentation reactions preceding the destruction of contaminant molecules [19]. Our results are consistent with this assumption but cannot be used to confirm it beyond doubt in the absence of spectroscopic data for the destruction of the plasma itself. 3.3.2. Analysis of byproducts and species in the plasma A preliminary study of the byproducts formed during and after the destruction of carbon tetrachloride in the argon plasma was conducted by using four analytical techniques, namely: gas chromatography/mass spectrometry (GC/MS), gas chromatography with electron capture detection (ECD), X-ray diffraction spectroscopy and light emission spectroscopy. 83
Destrucción de VOCs con plasma de Argón Figure 3.6: Variation of %DRE and the CCl 4 concentration at the reactor outlet as a function of that introduced in the plasma at different microwave power levels. The total flow-rate included those of argon and CCl 4 vapour. 84 % DRE CCl concentration out (ppb) 4 100,0 99,5 99,0 98,5 98,0 97,5 97,0 1400 1200 1000 800 600 400 200 0 10 100 1000 10000 100000 CCl concentration in (ppm) 4 3.3.2.1. Gaseous byproducts Argon plasma Total flow rate: 1.0 L/min 1000 W 600 W 300 W 250 W 200 W 100 W The analysis of the byproducts of the destruction of carbon tetrachloride by GC/MS and ECD revealed the presence of no other halogen-containing organic compound than CCl4 itself [20]; also, under optimal conditions, its concentration never exceeded 10 ppb. In fact, the sole additional species found was Cl2 [21], which was detected by GC/MS and in very small (trace) amounts. Therefore, alternative pathways for the loss of carbon and chloride in the destruction of CCl4 must exist.
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UNIVERSIDAD DE CÓRDOBA FACULTAD DE
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ESTUDIO Y CARACTERIZACIÓN DE UN PL
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Este trabajo ha sido realizado en e
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Dedicado a Rocío, Darío y Noah Un
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Índice DESTRUCCIÓN DE VOCS CON PL
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Índice iv 4.4. Ejemplo: Antorcha d
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ÍNDICE DE FIGURAS Figura I.1: Esqu
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Índice Figure 3.11: Variation of t
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Índice Figure 6.5: Radial and axia
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ESTRUCTURA Y OBJETIVOS El presente
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I.1. Compuestos orgánicos volátil
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Introducción droguerías. En el si
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Introducción agua subterránea. Es
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I.2.1. Técnicas de recuperación d
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Introducción concentraciones relat
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Introducción cuando el gas sale de
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Introducción los gases a algún va
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Introducción incineradores catalí
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Introducción En la figura I.3 se m
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Introducción plasma, y por tanto r
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I.3.1. Descargas corona pulsadas In
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Introducción En este caso, la mues
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Introducción por tanto, las dimens
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Introducción refiere. De hecho la
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Introducción [26] Hsiao MC, Merrit
Page 62 and 63: CAPÍTULO 1 REMOVAL OF VOLATILE ORG
Page 64 and 65: 1.2. Experimental set-up Capítulo
Page 66 and 67: Capítulo 1 The destruction percent
Page 68 and 69: Capítulo 1 Our data also support t
Page 70 and 71: % DRE % DRE 100,0000 100,0000 99,99
Page 72 and 73: Capítulo 1 Energy efficiencies of
Page 74 and 75: CAPÍTULO 2 APPLICATION OF A MICROW
Page 76 and 77: Capítulo 2 at atmospheric pressure
Page 78 and 79: 2.2.1. Microwave generator and coup
Page 80 and 81: 2.3. Results 2.3.1. Destruction of
Page 82 and 83: Capítulo 2 mm. The curves are simi
Page 84 and 85: Capítulo 2 In obtaining high energ
Page 86 and 87: Capítulo 2 Figure 2.6b shows the v
Page 88 and 89: Capítulo 2 revealed the presence o
Page 90 and 91: Capítulo 2 destruction step but un
Page 92 and 93: Capítulo 2 concentrations in the p
Page 94: [23] B.M. Penetrante, et al.: Plasm
Page 98 and 99: CAPÍTULO 3 ASSESSMENT OF A NEW CAR
Page 100 and 101: Capítulo 3 enhanced destruction an
Page 102 and 103: 3.2.1. Microwave generator and its
Page 104 and 105: 3.2.2. Sample insertion Capítulo 3
Page 106 and 107: Capítulo 3 concentration was a res
Page 108 and 109: Capítulo 3 Figure 3.4: Variation o
Page 112 and 113: Concentration CO 2 (ppm) 10000 1000
Page 114 and 115: Capítulo 3 CuCl2·2H2O on glass su
Page 116 and 117: Capítulo 3 Figure 3.10 shows some
Page 118 and 119: 3.4. Conclusions Capítulo 3 The pr
Page 120: Capítulo 3 [14] A. Rodero, M.C. Qu
Page 123 and 124: Destrucción de VOCs con plasma de
Page 148 and 149: CAPÍTULO 5 APPLICATION OF MICROWAV
Page 150 and 151: Capítulo 5 99% were achieved. Usin
Page 152 and 153: COMPONENT DESCRIPTION Microwave gen
Page 154 and 155: Concentration (ppb) 300 250 200 150
Page 156 and 157: TCC Concentration (ppb) 1100 1000 9
Page 158 and 159: Capítulo 5 5.4 and 5.5 are virtual
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Capítulo 5 indicated that the syst
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Capítulo 5 was nearly 100%. The de
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Capítulo 5 GC/MS analyses revealed
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Figure 5.12: CN rotational bands ob
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5.5. References [1] R.E. Doherty: J
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DISTRIBUCIÓN DE TEMPERATURAS Y ESP
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Distribución de temperaturas y esp
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CAPÍTULO 7 AXIAL DISTRIBUTION OF T
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Capítulo 7 of C2HCl3 achieve destr
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7.3. Results Capítulo 7 To study t
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7.4. References [1] N.J. Park Ridge
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Axial position (mm) Axial Position
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CONCLUSIONES GENERALES • Ha sido
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Conclusiones Generales punta del ac
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ANEXO Producción científica fruto
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Producción científica fruto de es
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