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estudio y caracterización de un plasma de microondas a presión ...

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Capítulo 2<br />

<strong>de</strong>struction step but <strong>un</strong><strong>de</strong>rgo subsequent <strong>de</strong>composition and recombination into the<br />

above-<strong>de</strong>scribed by-products.<br />

Intensity (a.u.)<br />

Figure 2.11: Influence of the initial concentration of C 2HCl 3 on the rotational bandheads of CuCl<br />

in the discharge.<br />

Intensity (a.u.)<br />

3500<br />

3000<br />

2500<br />

2000<br />

1500<br />

1000<br />

500<br />

0<br />

428 430 432 434 436 438 440 442 444 446 448<br />

24000<br />

22000<br />

20000<br />

18000<br />

16000<br />

14000<br />

12000<br />

10000<br />

8000<br />

6000<br />

4000<br />

2000<br />

CuCl Bands<br />

Flow rate: 1.0L/min<br />

MW Power: 600 W<br />

600 ppm<br />

100 ppm<br />

50 ppm<br />

20 ppm<br />

10 ppm<br />

CN Rotational Band<br />

Helium <strong>plasma</strong><br />

Flow rate: 1 L/min<br />

MW power: 600 W<br />

1000 ppmv C 2 HCl 3<br />

Wavelength (nm)<br />

0<br />

384 385 386 387 388 389<br />

Wavelength (nm)<br />

Figure 2.12: Rotational bandheads of CN in the discharge.<br />

63

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