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3.4. Conclusions Capítulo 3 The proposed system for destroying volatile organic contaminants is an effective tool for the removal of carbon tetrachloride. By using the minimum microwave power (300 W) and a flow-rate of gas within the optimum range at each coupler tip diameter, one can reach an energy efficiency of up to 3000 g/kW·h at the highest possible flow- rate and concentration levels. The extent of CCl4 destruction increases with increasing concentration of contaminant in the plasma. Based on the analysis of byproducts, the CCl4 concentration at the reactor outlet following treatment in the plasma is in the parts-per-billion region under optimum conditions and the main pathway for the loss of chlorine is the formation of a copper chloride deposit on the reactor surfaces. This is consistent with the spectroscopic measurements, based on which the intensity of the bandhead for CuCl increases while that of atomic chlorine remains constant as the amount of CCl4 present in the plasma increases. CuCl is less toxic and easier to handle than CCl4; also, it can be used for various purposes. Therefore, the proposed method suppresses the most serious hazards of the initial compound by fixing chloride in a solid, non-volatile form. The method must be implemented at low microwave power and flow-rate levels in order to avoid the production of N2O and NO. Although these two species appear at substantial concentrations if the operating conditions ensuring maximal destruction are used, the proposed system allows one to use flow-rate and microwave power values over wide enough ranges to ensure minimal environmental contamination with a high energy efficiency. 91
Destrucción de VOCs con plasma de Argón 3.5. References [1] R.E. Doherty, A history of the production and use of carbon tetrachloride, tetrachloroethylene, trichloroethylene and 1,1,1-trichloroethane in the United States: Part 1 - Historical background; Carbon tetrachloride and tetrachloroethylene, Journal of Environmental Forensics 1 (2000) 69-81. [2] M.D.Driessen, A.L.Goodman, T.M.Miller, G.A.Zaharias, V.H.Grassian, Gas-phase photooxidation of trichloroethylene on TiO2 and ZnO: Influence of trichloroethylene pressure, oxygen pressure, and the photocatalyst surface on the product distribution, Journal Phys. Chem. B 102 (1998) 549-556. [3] K.Y.Jung and S.B.Park, Enhanced photoactivity of silica-embedded titania particles prepared by sol-gel process for the decomposition of trichloroethylene, Appl. Catal. B: Environ. 25 (2000) 249-256. [4] E.C.Moretti and N.Mukhopadhyay, VOC control - current practices and futuretrends, Chemical Engineering Progress 89 (7) (1993). [5] J.J.Spivey, Complete catalytic-oxidation of volatile organics, Ind. Eng. Chem. Res. 26 (1987) 2165-2180. [6] M.Mohseni, Gas phase trichloroethylene (TCE) photooxidation and byproduct formation: photolysis vs. titania/silica based photocatalysis, Chemosphere 59 (2005) 335-342. [7] T.Oda, T.Takahashi, K.Tada, Decomposition of dilute trichloroethylene by nonthermal plasma, IEEE Transactions On Industry Applications 35 (1999) 373-379. [8] L. A. Rosocha, Processing of hazardous chemicals (Chapter 11). 261-298. [9] M. Moisan, G. Sauvè, Z. Zakrzewski and J. Hubert, An atmospheric pressure waveguide-fed microwave plasma torch: the TIA design, Plasma Sources Science And Technology 3,4 (1994) 584-592. [10] A. Rodero, R. Alvarez, M.C. Quintero, A. Sola, A. Gamero, Spectroscopic study of a helium microwave discharge produced by the axial injection torch, High Temperature Material Processes 8 (4) (2004) 519-533. [11] K. Urashima and J.S. Chang, Removal of Volatile Organic Compounds from air streams and industrial flue gases by non-thermal plasma technology, IEEE Transactions on Dielectrics and Electrical Insulation 7 (5) (2000) 602-614. [12] R. Alvarez, A. Rodero, M.C. Quintero, S.J. Rubio, Radial study of atomic and ionic argon species in the helium-argon microwave plasma produced by the axial injection torch, Acta Physica Slovaca 54 (2) (2004) 105-113. [13] E.A.H. Timmermans, M.J. van de Sande, J.J.A.M. van der Mullen, Plasma characterization of an atmospheric microwave plasma torch using diode laser absorption studies of the argon 4s(3)P(2) state, Plasma Sources Science & Technology 12 (3) (2003) 324-334. 92
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UNIVERSIDAD DE CÓRDOBA FACULTAD DE
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ESTUDIO Y CARACTERIZACIÓN DE UN PL
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Este trabajo ha sido realizado en e
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Dedicado a Rocío, Darío y Noah Un
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Índice DESTRUCCIÓN DE VOCS CON PL
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Índice iv 4.4. Ejemplo: Antorcha d
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ÍNDICE DE FIGURAS Figura I.1: Esqu
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Índice Figure 3.11: Variation of t
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Índice Figure 6.5: Radial and axia
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ESTRUCTURA Y OBJETIVOS El presente
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I.1. Compuestos orgánicos volátil
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Introducción droguerías. En el si
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Introducción agua subterránea. Es
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I.2.1. Técnicas de recuperación d
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Introducción concentraciones relat
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Introducción cuando el gas sale de
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Introducción los gases a algún va
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Introducción incineradores catalí
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Introducción En la figura I.3 se m
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Introducción plasma, y por tanto r
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I.3.1. Descargas corona pulsadas In
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Introducción En este caso, la mues
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Introducción por tanto, las dimens
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Introducción refiere. De hecho la
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Introducción [26] Hsiao MC, Merrit
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CAPÍTULO 1 REMOVAL OF VOLATILE ORG
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1.2. Experimental set-up Capítulo
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Capítulo 1 The destruction percent
Page 68 and 69: Capítulo 1 Our data also support t
Page 70 and 71: % DRE % DRE 100,0000 100,0000 99,99
Page 72 and 73: Capítulo 1 Energy efficiencies of
Page 74 and 75: CAPÍTULO 2 APPLICATION OF A MICROW
Page 76 and 77: Capítulo 2 at atmospheric pressure
Page 78 and 79: 2.2.1. Microwave generator and coup
Page 80 and 81: 2.3. Results 2.3.1. Destruction of
Page 82 and 83: Capítulo 2 mm. The curves are simi
Page 84 and 85: Capítulo 2 In obtaining high energ
Page 86 and 87: Capítulo 2 Figure 2.6b shows the v
Page 88 and 89: Capítulo 2 revealed the presence o
Page 90 and 91: Capítulo 2 destruction step but un
Page 92 and 93: Capítulo 2 concentrations in the p
Page 94: [23] B.M. Penetrante, et al.: Plasm
Page 98 and 99: CAPÍTULO 3 ASSESSMENT OF A NEW CAR
Page 100 and 101: Capítulo 3 enhanced destruction an
Page 102 and 103: 3.2.1. Microwave generator and its
Page 104 and 105: 3.2.2. Sample insertion Capítulo 3
Page 106 and 107: Capítulo 3 concentration was a res
Page 108 and 109: Capítulo 3 Figure 3.4: Variation o
Page 110 and 111: Capítulo 3 different microwave pow
Page 112 and 113: Concentration CO 2 (ppm) 10000 1000
Page 114 and 115: Capítulo 3 CuCl2·2H2O on glass su
Page 116 and 117: Capítulo 3 Figure 3.10 shows some
Page 120: Capítulo 3 [14] A. Rodero, M.C. Qu
Page 123 and 124: Destrucción de VOCs con plasma de
Page 148 and 149: CAPÍTULO 5 APPLICATION OF MICROWAV
Page 150 and 151: Capítulo 5 99% were achieved. Usin
Page 152 and 153: COMPONENT DESCRIPTION Microwave gen
Page 154 and 155: Concentration (ppb) 300 250 200 150
Page 156 and 157: TCC Concentration (ppb) 1100 1000 9
Page 158 and 159: Capítulo 5 5.4 and 5.5 are virtual
Page 160 and 161: Capítulo 5 indicated that the syst
Page 162 and 163: Capítulo 5 was nearly 100%. The de
Page 164 and 165: Capítulo 5 GC/MS analyses revealed
Page 166 and 167: Figure 5.12: CN rotational bands ob
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5.5. References [1] R.E. Doherty: J
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DISTRIBUCIÓN DE TEMPERATURAS Y ESP
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Distribución de temperaturas y esp
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CAPÍTULO 7 AXIAL DISTRIBUTION OF T
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Capítulo 7 of C2HCl3 achieve destr
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7.3. Results Capítulo 7 To study t
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7.4. References [1] N.J. Park Ridge
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Axial position (mm) Axial Position
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CONCLUSIONES GENERALES • Ha sido
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Conclusiones Generales punta del ac
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ANEXO Producción científica fruto
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Producción científica fruto de es
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