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book of abstracts - IM2NP

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A B S T R A C T S FRIDAY, JULY 2 N A N O S E A 2 0 1 0<br />

We found out substitution energy <strong>of</strong> defects and its energy level. We studied the B-tube with hole and<br />

determined the energy <strong>of</strong> defect activation and the relative portion <strong>of</strong> vacancies.<br />

At the moment active search <strong>of</strong> new surface structures capable <strong>of</strong> effective adsorption <strong>of</strong> different gases is<br />

being carried out. We have investigated an binding opportunity between the H, F, O, Cl atoms and the outer<br />

surface <strong>of</strong> B-nanotube (6,6) and have studied the mechanism <strong>of</strong> this process. The calculations are carried out<br />

with the use <strong>of</strong> quantum chemical MNDO scheme. Regular hydrogenation <strong>of</strong> boron nanotubes was<br />

investigated. We can confirm that generation <strong>of</strong> gas-phase hydrogen composite materials based on boron<br />

nanotube is possible.<br />

[1] Litinsky A.O., Lebedev N.G., Zaporotskova I.V. Jurnal phyzicheskoi himii. 69. № 1, 189 (1995).<br />

12H00-12H20<br />

Epitaxial growth and magnetic properties <strong>of</strong> Mn5Ge3 compound on Ge(111)<br />

A. Spiesser1, A. Watanabe2, S.F. Olive-Mendez, M.-T. Dau1, L.A. Michez1, S.<br />

Nozaki2, A. Glachant1, V. Le Thanh1 ( 1 Centre Interdisciplinaire de<br />

Nanoscience de Marseille (CINaM-CNRS), Aix-Marseille Université,<br />

Campus de Luminy, case 913, 13288 Marseille, France 2 Department <strong>of</strong><br />

Electronic Engineering, the University <strong>of</strong> Electro-Communications, 1-5-1<br />

Ch<strong>of</strong>ugaoka, Ch<strong>of</strong>u-shi, Tokyo 182-8585, Japan)<br />

1 – Introduction<br />

The emerging field <strong>of</strong> spintronics, which is regarded as next-generation electronics, would be<br />

dramatically boosted if room-temperature ferromagnetism could be added to semiconductor devices and<br />

integrated circuits that are compatible with silicon CMOS technology. Among numerous approaches such as<br />

growth <strong>of</strong> Ge1-xMnx diluted magnetic semiconductors or using spin injection from a transition metal across<br />

a thin oxide barrier layer, the synthesis <strong>of</strong> Mn5Ge3/Ge heterostructures is <strong>of</strong> particular interest since<br />

Mn5Ge3 is intermetallic and ferromagnetic up to room temperature. Achieving a high-quality epitaxial<br />

Mn5Ge3 film on Ge not only allows a direct and high efficient injection <strong>of</strong> spin by tunnel effect through the<br />

Schottky barrier but also <strong>of</strong>fers a direct route to be integrated into group-IV semiconductors.<br />

2 – Abstract<br />

Epitaxial growth <strong>of</strong> Mn5Ge3/Ge(111) have been investigated by combining structural characterizations via<br />

reflection high-energy electron diffraction (RHEED), transmission electronic microscopy (TEM) and<br />

magnetic characterizations using vibrating sample magnetometer (VSM), superconducting quantum<br />

interference device (SQUID) magnetometers. It is shown that despite a misfit as high as 3.7% between<br />

Mn5Ge3 and Ge(111), high quality Mn5Ge3 films with an atomically smooth interface can be obtained.<br />

However, no pseudomorphic growth was observed as in covalent heteroepitaxial systems, Mn5Ge3 films<br />

were found to be fully strain relieved even after the deposition <strong>of</strong> a monolayer thick film. We have also<br />

investigated the effect <strong>of</strong> the film thickness on the structural and magnetic properties <strong>of</strong> Mn5Ge3 films. For<br />

films whose thickness is smaller than 50 nm, the easy axis <strong>of</strong> magnetization lies in the layers and the hard<br />

axis is perpendicular to the sample surface. When the film thickness increases, the coercive field becomes<br />

progressively smaller and the easy axis <strong>of</strong> magnetization is found to get out <strong>of</strong> the hexagonal basal (001) plan<br />

138

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