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Morphology and plasmonic properties of self-organized arrays of ...

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52 CHAPTER 3. SELF-ORGANIZED NPS ARRAYS: MORPH. ASPECTSThe deposition rate was acritical parameter for the achievement <strong>of</strong> well-ordered nanostructures.In fig. 3.3(b, c) we report AFM images measured ex-situ on two different samplesafter the deposition <strong>of</strong> LiF at a rate <strong>of</strong> 4 nm/min <strong>and</strong> 1 nm/min, respectively; inboth cases the substrate temperature was kept constant at ≈ 300 ◦ C <strong>and</strong> approximately250 nm <strong>of</strong> LiF were deposited. For the sample in panel (c) (1 nm/min) an ordered ripplemorphology is clearly visible, showing parallel <strong>and</strong> coherently aligned [001] macrostepswith an average spacing <strong>of</strong> ≈ 35 nm, <strong>and</strong> facets at an angle <strong>of</strong> 45 ◦ with respect to thesample plane (panel (c)). The morphology <strong>of</strong> the sample in panel (b) (4 nm/min), instead,is dramatically different. Here the surface is completely chaotic, consisting <strong>of</strong> r<strong>and</strong>omlyoriented rectangular prisms with {100} facets: in this case the deposition rate was so highto prevent either long range ordering but also any local crystallographic matching withthe substrate, leading to the proliferation <strong>of</strong> st<strong>and</strong>-alone nanosized crystals. Therefore,we fixed the deposition rate at 1 nm/min for all the samples under scrutiny in this work.a.[001]b.[001]c.[001]d.[001]Figure 3.4: AFM images <strong>of</strong> a nanopatterned LiF(110) sample with Λ = 35 nm, as afunction <strong>of</strong> the deposited amount <strong>of</strong> LiF. Panel a: t LiF = 60 nm. Panel b: t LiF = 120 nm.Panel c: t LiF = 180 nm. Panel d: t LiF = 250 nm. Inset <strong>of</strong> the figures: Fourier spectra <strong>of</strong>the corresponding images.In order to investigate the evolution <strong>of</strong> the surface morphology from flat to nanostructured,we monitored the surface morphology at different stages <strong>of</strong> deposition. AFMimages measured in correspondence <strong>of</strong> increasing deposition times are shown in fig. 3.4,at thickness step <strong>of</strong> ≈ 60 nm. The [100] facets are already visible at the lowest coverage<strong>of</strong> 60 nm (panel (a)), forming elongated structures a few tens <strong>of</strong> nanometers long <strong>and</strong>oriented along the [001] direction; at this stage, however, the macrosteps are still relativelyr<strong>and</strong>omly distributed <strong>and</strong> no univocal long range order can be distinguished. The

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