78 CHAPTER 5. MODELLING AND ANALYSIS OF THE OPT. PROP.semi-infinite homogeneous substrate (N 2 ); for simplicity we assume the refractive indicesN i as real constants (<strong>and</strong> N 0 = 1). Referring to fig. 5.3, the constructive interferenceoccurs whenever the difference between the optical paths travelled by the reflected beamsis an integer multiple m <strong>of</strong> the wavelength, i.e. [126]N 1 (BC +CD)−N 0 AD = 2dN 1 cosθ 1 = mλ m = m hcE mwhere E(λ) = hc/λ is the photon energy. The period <strong>of</strong> the interference figure (forexample as a function <strong>of</strong> E) is then given by∆E = E m+1 −E m =hc2dN 1 cosθ 1,directly related to the thickness <strong>and</strong> refractive index <strong>of</strong> the film. In this simple example,the period ∆E is independent <strong>of</strong> the energy <strong>and</strong> inversely proportional to d; in all realcases, however, this is not true due to the dispersion <strong>of</strong> the refractive indices, so a completeanalysis <strong>of</strong> the optical constants is required to estimate the thickness.In order to characterize the nanostructured substrates, we proceed as in the previouscase, building an optical model <strong>and</strong> then performing a best-fit procedure to extract theoptical constants. We extend the model employed for the bare LiF(110), including asecondCauchylayertodescribethedepositedlayer, thatrequiresopticalconstantsslightlydifferent from the substrate. Then, in order to reproduce the anisotropy <strong>of</strong> Ψ <strong>and</strong> ∆, weaddontop<strong>of</strong>the“film”layerabirefringentsurfacelayer, havingdifferentrefractiveindicesin the directions parallel <strong>and</strong> perpendicular the ripples, which accounts for the rippledsurface morphology. An accurate treatment would require to fully consider the sawtoothlikeshape <strong>of</strong> the ripples; here, instead, we apply a simpler approximation, treating theripples as parallel cylinders aligned in the plane <strong>of</strong> the sample. This is implemented bycombining two Bruggeman effective medium layers, with depolarization factors L || = 0along the ripples <strong>and</strong> L ⊥ = 0.5 in the perpendicular directions (see fig. 1.11(c)), in abirefringent material placed on top <strong>of</strong> the film; both the EMA layers are composed inequal proportion <strong>of</strong> air <strong>and</strong> <strong>of</strong> the underlying film material. As in the previous case, weneglect any effect <strong>of</strong> surface contamination or disorder. The overall structure <strong>of</strong> the modelis sketched in fig. 5.4(c). All the components employed (EMAs, birefringent layers, etc.)are st<strong>and</strong>ard elements provided by the WVASE s<strong>of</strong>tware.The best-fit Ψ <strong>and</strong> ∆ curves corresponding to the experimental spectra <strong>of</strong> a nanopatternedLiF (fig. 4.3) are reported in fig. 5.4(a,b). The best-fit thickness <strong>of</strong> the film <strong>and</strong> <strong>of</strong>the roughness layer, for the particular sample under scrutiny, were 249 nm <strong>and</strong> 4.2 nm,respectively, while a ripple periodicity <strong>of</strong> about 35 nm was deduced from AFM. The agreementbetween the simulations <strong>and</strong> the experiments is again not excellent, but the mainfeatures <strong>of</strong> the ellipsometric spectra are all well reproduced. The calculated curves forthe plane <strong>of</strong> incidence parallel <strong>and</strong> perpendicular the ripples direction are indeed slightlyshifted, the differences being more pronounced in ∆ than in Ψ, <strong>and</strong> in agreement with theexperiments, indicating that the approximation to cylinder is good for a first order analysis.The thickness <strong>of</strong> the effective layer was instead quite underestimated in comparisonto the AFM data; in the ideal case <strong>of</strong> a perfect ripple structure, the depth <strong>of</strong> the valleysis equal to half <strong>of</strong> the periodicity, corresponding to ≈17 nm for the current case; if wefurther include some disorder <strong>and</strong> roughness, then we would expect a thickness greaterthan ≈20 nm, which is clearly in contrast with the value <strong>of</strong> merely 4.2 nm extracted fromthe fit.
5.1. LITHIUM FLUORIDE NANOSTRUCTURES 798.07.6||184180 [deg]7.2 [deg]1766.86.4172||1.0 2.0 3.0 4.0a. E [eV]b.1.02.0E [eV]3.04.01.44substratefilmBirefringent layerCauchy layerN1.421.401.38Cauchy layerc. d.0.51.52.5E [eV]3.54.5Figure 5.4: Panels a, b: experimental (continuous lines) <strong>and</strong> calculated (dashed lines)Ψ <strong>and</strong> ∆ curves for LiF substrates after homoepitaxial deposition <strong>of</strong> 250 nm <strong>of</strong> LiF, atincidence θ = 50 ◦ <strong>and</strong> plane <strong>of</strong> incidence either parallel (red lines) <strong>and</strong> perpendicular(black lines) the ripples ridges. Panel c: sketch <strong>of</strong> the optical model employed for thecalculations. Panel d: real parts <strong>of</strong> the calculated refractive indices for the substrate (redline) <strong>and</strong> the deposited layer <strong>of</strong> LiF (black line).The calculated real parts <strong>of</strong> the refractive indices for the substrate <strong>and</strong> the film areshown in fig. 5.4(d) (the imaginary parts are zero at all wavelengths). The two curvesare slightly different, with variations within the 1% <strong>of</strong> the absolute values, leading tothe observed interference effects; in particular, moving towards higher energies, the realrefractive index <strong>of</strong> the film increases more rapidly than the substrate, indicating thepossible presence <strong>of</strong> absorptions at energies lower than the b<strong>and</strong> gap, consistent with theformation <strong>of</strong> crystal defects or color centers [200, 201] during the deposition <strong>of</strong> LiF.Summarizing the results <strong>of</strong> this section, we characterized the optical <strong>properties</strong> <strong>of</strong> theLiF substrates before <strong>and</strong> after the deposition <strong>of</strong> LiF films, performed for inducing theformation <strong>of</strong> the ripples nanostructures. The refractive index <strong>of</strong> bulk LiF was calculatedfor the bare LiF(110) samples, <strong>and</strong> found to be isotropic within the experimental accuracy.The deposited layer <strong>of</strong> LiF, instead, exhibited a slightly different behaviour with respectto the bulk, <strong>and</strong> showed a weak optical anisotropy referable to the ripple morphology. Thevariations <strong>of</strong> the refractive indices were found to lie within the 1% <strong>of</strong> the bulk value, <strong>and</strong>the birefringence was much weaker than the optical anisotropy observed on the gold NPs<strong>arrays</strong>. Therefore, in the framework <strong>of</strong> the model presented in the next section, we willneglect these effects, <strong>and</strong> treat the substrates as homogeneous <strong>and</strong> isotropic materials.