Morphology and plasmonic properties of self-organized arrays of ...
Morphology and plasmonic properties of self-organized arrays of ...
Morphology and plasmonic properties of self-organized arrays of ...
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3.1. GROWTH AND CHARACTERIZATION OF LIF SUBSTRATES 53corresponding Fourier spectral density is shown in the inset <strong>of</strong> fig. 3.4(a): the spectrumis predominantly elongated along the [1¯10] direction, indicating features <strong>of</strong> the real imagewith preferential [001] orientation, but it is also spread in the [001] direction, confirmingthe lack <strong>of</strong> long range order. Increasing the coverage, as in panels (b) <strong>and</strong> (c), themacrosteps get longer, merging with one another <strong>and</strong> eventually developing into a regularripple structure; correspondingly, the Fourier spectra become progressively sharper <strong>and</strong>confined in the [1¯10] direction. After the deposition <strong>of</strong> ≈ 250 nm <strong>of</strong> LiF (panel (d)), theripple periodicity is well defined <strong>and</strong> the [001] macrosteps are fewμm long. At even highercoverages, the quality <strong>of</strong> the ripples does not change significantly, but several defects beginto proliferate, mainly in proximity <strong>of</strong> the polishing scratches, leading to the formation <strong>of</strong>r<strong>and</strong>omly oriented nanocubes, similar to fig. 3.3(b).a.b.[001] [001]c. d.[001][001]Figure 3.5: AFM images <strong>of</strong> nanopatterned LiF(110) samples after the deposition <strong>of</strong> t LiF ≈250 nm <strong>of</strong> LiF, grown at different temperatures. Panel a: T = 250 ◦ C, Λ = (25±2) nm.Panel b: T = 300 ◦ C, Λ = (35±3) nm. Panel c: T = 350 ◦ C, Λ = (45±5) nm. Panel d:T = 400 ◦ C, Λ = (60±7) nm. Inset <strong>of</strong> the figures: Fourier spectra <strong>of</strong> the correspondingimages.The macrosteps periodicity Λ <strong>and</strong>, in general, the structure <strong>of</strong> the ripples are determinedby the adatoms mobility <strong>and</strong> diffusion length during the homoepitaxy, so theystrongly depend on the substrate temperature <strong>and</strong> the deposition rate. Having fixed therate at ≈ 1 nm/min, we focused on the study <strong>of</strong> the periodicity as a function <strong>of</strong> thetemperature T. In fig. 3.5 we report various AFM images measured on several samples