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Duke University 2008-2009 - Office of the Registrar - Duke University

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288. Sensor Array Signal Processing. An in-depth treatment <strong>of</strong> <strong>the</strong> fundamental concepts,<br />

<strong>the</strong>ory, and practice <strong>of</strong> sensor array processing <strong>of</strong> signals carried by propagating waves.<br />

Topics include: multidimensional frequency-domain representations <strong>of</strong> space-time signals<br />

and linear systems; apertures and sampling <strong>of</strong> space-time signals; beamforming and filtering<br />

in <strong>the</strong> space-time and frequency domains, discrete random fields; adaptive beamforming<br />

methods; high resolution spatial spectral estimation; optimal detection, estimation, and<br />

performance bounds for sensor arrays; wave propagation models used in sensor array<br />

processing; blind beamforming and source separation methods; multiple-input-multipleoutput<br />

(MIMO) array processing; application examples from radar, sonar, and communications<br />

systems. Instructor: Staff. 3 units.<br />

289. Adaptive Filters. Adaptive digital signal processing with emphasis on <strong>the</strong> <strong>the</strong>ory and<br />

design <strong>of</strong> finite-impulse response adaptive filters. Stationary discrete-time stochastic<br />

processes, Wiener filter <strong>the</strong>ory, <strong>the</strong> method <strong>of</strong> steepest descent, adaptive transverse filters<br />

using gradient-vector estimation, analysis <strong>of</strong> <strong>the</strong> LMS algorithm, least-squares methods,<br />

recursive least squares and least squares lattic adaptive filters. Application examples in noise<br />

canceling, channel equalization, and array processing. Prerequisites: Electrical and<br />

Computer Engineering 281 and 282 or consent <strong>of</strong> instructor. Instructor: Krolik. 3 units.<br />

298. Advanced Topics in Electrical and Computer Engineering. Opportunity for study<br />

<strong>of</strong> advanced subjects in electrical and computer engineering. Instructor: Staff. 1 unit.<br />

299. Advanced Topics in Electrical and Computer Engineering. Opportunity for study<br />

<strong>of</strong> advanced subjects related to programs within <strong>the</strong> electrical and computer engineering<br />

department tailored to fit <strong>the</strong> requirements <strong>of</strong> a small group. Instructor: Staff. 3 units.<br />

For Graduate Students Only<br />

310. Foundations <strong>of</strong> Nanoscale Science and Technology. This course is <strong>the</strong> introductory<br />

course for <strong>the</strong> Graduate Certificate Program in Nanoscience (GPNANO) and is designed to<br />

introduce students to <strong>the</strong> interdisciplinary aspects <strong>of</strong> nanoscience by integrating important<br />

components <strong>of</strong> <strong>the</strong> broad research field toge<strong>the</strong>r. This integrated approach will cross <strong>the</strong><br />

traditional disciplines <strong>of</strong> biology, chemistry, electrical & computer engineering, computer<br />

science, and physics. Fundamental properties <strong>of</strong> materials at <strong>the</strong> nanoscale, syn<strong>the</strong>sis <strong>of</strong><br />

nanoparticles, characterization tools, and self-assembly. Prerequisites: Physics 62L and<br />

Chem 21L or instructor approval. C-L: NANO 200 pending in COMPSCI, CHEM, and<br />

PHYS. Instructor: Dwyer. 3 units. C-L: Nanosciences 310<br />

316. Advanced Physics <strong>of</strong> Semiconductor Devices. Semiconductor materials: band<br />

structure and carrier statistics. Advanced treatments <strong>of</strong> metal-semiconductor contacts,<br />

Schottky barriers, p-n junctions, bipolar transistors (charge-control and Gummel-Poon<br />

models), and field-effect transistors (short channel effects, scaling <strong>the</strong>ory, subthreshold<br />

conduction, nonuniformly doped substrates, surface and buried-channel devices, hotelectron<br />

effects). Device modeling in two dimensions using PISCES. Prerequisite: Electrical<br />

Engineering 216. Instructor: Massoud. 3 units.<br />

318. Integrated Circuit Fabrication Laboratory. Introduction to IC fabrication processes.<br />

Device layout. Mask design and technology. Wafer cleaning, etching, <strong>the</strong>rmal oxidation,<br />

<strong>the</strong>rmal diffusion, lithography, and metallization. Laboratory fabrication and characterization<br />

<strong>of</strong> basic IC elements (p-n junctions, resistors, MOS capacitors, gated diodes, and<br />

MOSFETs). Use <strong>of</strong> four-point probe, ellipsometer, spreading resistance probe, scanning<br />

electron microscope, and evaporation system. Testing <strong>of</strong> basic inverters and gates.<br />

Prerequisite: Electrical Engineering 218 and consent <strong>of</strong> instructor. Instructor: Massoud. 3<br />

units.<br />

352. Advanced Topics in Digital Systems. A selection <strong>of</strong> advanced topics from <strong>the</strong> areas<br />

<strong>of</strong> digital computer architectures and fault-tolerant computer design. Prerequisite: Electrical<br />

Engineering 252 or equivalent. Instructor: Staff. 3 units. C-L: Computer Science 320<br />

361. Advanced VLSI Design. 3 units. C-L: see Computer Science 322<br />

Courses <strong>of</strong> Instruction 153

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