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Basic Research Needs for Solar Energy Utilization - Office of ...

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passivating window and back-surface-field layers on either sides <strong>of</strong> the p-n junctions, and<br />

contacting layers to ensure low resistance contacts to the rest <strong>of</strong> the circuit. This includes very<br />

highly doped shorting (tunnel) junctions between the subcells <strong>of</strong> the multijunction device.<br />

Growth <strong>of</strong> III-V solar cells on silicon has also been demonstrated, but these cells usually show<br />

inferior crystal quality compared with growth on GaAs or germanium. Recently, the first latticematched<br />

III-V-on-silicon tandem cell has been demonstrated, with GaNPAs (1.7 eV) as the top<br />

cell (Geisz et al. 2004).<br />

Achieving 40% and greater efficiencies is being pursued by several groups worldwide. One<br />

approach is the use <strong>of</strong> 2–3% nitrogen in GaxIn1-xAs1-yNy to reduce the band gap to about 1 eV<br />

(<strong>for</strong> the third junction in a four-junction device). Although 1-eV GaInAsN can be grown latticematched<br />

to GaAs, the addition <strong>of</strong> nitrogen degrades the electrical quality <strong>of</strong> the GaAs, thus far<br />

preventing the realization <strong>of</strong> a higher efficiency with a four-junction design. Other potential 1-eV<br />

materials are also being investigated. The use <strong>of</strong> five- or six-junction cells reduces the amount <strong>of</strong><br />

current per junction and provides a pathway <strong>for</strong> GaInAsN to be a useful addition.<br />

As <strong>for</strong> other III-V devices, commercial deposition systems are available <strong>for</strong> growing these<br />

multilayer devices with film thickness uni<strong>for</strong>mities within

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