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Mechanics and Tribology of MEMS Materials - prod.sandia.gov ...

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All samples were coated with alkylsilane films, either PFTS or ODTS, <strong>and</strong> all samples<br />

were treated with the same release <strong>and</strong> coating processes used to deposit the alkylsilane films on<br />

<strong>MEMS</strong> devices. Briefly, the devices were released using an oxide etch (H2O:HF:HCl at<br />

100:10:1, room temperature for 30 minutes). Devices were then reoxidized (H2O:H2O2 at 1:1,<br />

room temperature for 10 minutes) to provide surface -OH sites on the silicon for bonding <strong>of</strong> the<br />

silane molecules. Devices were kept wet <strong>and</strong> transferred to the coating solution by solvent<br />

exchange in the following sequence: H2O to isopropyl alcohol to the neat solvent to the coating<br />

solution. For ODTS the solvent was hexadecane, <strong>and</strong> the coating solution consisted <strong>of</strong> a 0.001<br />

molar solution <strong>of</strong> ODTS in hexadecane. For PFTS the solvent was 1,1,2-trimethylpentane, <strong>and</strong><br />

the coating solution consisted <strong>of</strong> a 0.001 molar solution <strong>of</strong> PFTS in 1,1,2-trimethylpentane.<br />

Anhydrous solvents were used to prepare coating solutions within a nitrogen-purged glovebox,<br />

<strong>and</strong> the solutions were only used inside the glovebox. Solution volume was typically 300 ml in a<br />

perfluoroalkoxy (PFA) tank, <strong>and</strong> samples were transferred between solutions in PFA crystal<br />

carriers to minimize h<strong>and</strong>ling <strong>and</strong> contact between the coating apparatus <strong>and</strong> the <strong>MEMS</strong> devices.<br />

After 30 minutes in the coating tank, devices were moved to a rinse tank that contained the neat<br />

solvent. After moving the treated samples to the neat solvent for rinsing, the rinse tank was<br />

removed from the glovebox <strong>and</strong> the carrier transferred to an alcohol bath <strong>and</strong> then to pure water.<br />

Therefore, all process steps between the first rinse in neat solvent <strong>and</strong> the final rinse in neat<br />

solvent occurred in a nitrogen-purged glovebox (

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