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Mechanics and Tribology of MEMS Materials - prod.sandia.gov ...

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During processing <strong>of</strong> microelectromechanical systems with selective tungsten, operators<br />

observed that the devices behaved as if “sticky” immediately after treatment. Freshly treated<br />

devices were found to exhibit evidence <strong>of</strong> high adhesion, with inability to move under drive<br />

signals that would normally result in motion for alkylsilane coated devices as discussed in the<br />

last chapter. However, over a period <strong>of</strong> days, the devices were observed to begin operating more<br />

easily.<br />

In order to investigate the relationship between time dependent device behavior <strong>and</strong><br />

surface composition, we examined the surfaces <strong>of</strong> treated devices over a period <strong>of</strong> time after<br />

depsition <strong>of</strong> the tungsten. Samples with blanket films <strong>of</strong> polycrystalline silicon that had been<br />

treated with selective tungsten were examine using x-ray photoelectron spectroscopy,<br />

periodically for two weeks after treatment. All the samples were treated at the same time, <strong>and</strong><br />

stored in a desiccator. At each sampling interval, two coupons were removed from the<br />

desiccator <strong>and</strong> examined using XPS as described above. Figure 8.2 shows the atomic<br />

concentration <strong>of</strong> surface constituents as a function <strong>of</strong> time for the tungsten coated polycrystalline<br />

silicon.<br />

Concentration (At. %)<br />

40<br />

35<br />

30<br />

25<br />

20<br />

15<br />

10<br />

5<br />

0<br />

0 2 4 6 8 10 12 14<br />

Time (days)<br />

Fig. 8.2 Composition <strong>of</strong> polycrystalline surfaces treated with selective tungsten as a function <strong>of</strong><br />

time after deposition, while stored in a desiccator.<br />

Figure 8.2 indicates that the surface initially retains some residual fluorine, but is otherwise<br />

relatively clean in terms <strong>of</strong> organic contamination, considering that the surfaces are transferred in<br />

air from the deposition tool to the photoelectron spectrometer. The major species present on the<br />

surfaces after deposition are tungsten, nitrogen <strong>and</strong> oxygen. Over a period <strong>of</strong> about a week, the<br />

surface oxygen concentration increased slowly while the surface adsorbed organic molecules <strong>and</strong><br />

lost fluorine. Figure 8.3 shows the binding energy spectrum <strong>of</strong> W4f, <strong>and</strong> the assigned chemical<br />

configurations responsible for the multiple overlapping peaks in the spectrum. As shown in the<br />

figure, several valencies <strong>of</strong> tungsten are present. Several <strong>of</strong> the peaks may be assigned to more<br />

than one compound. Figure 8.4 shows the changes in tungsten moeties as a function <strong>of</strong> time,<br />

77<br />

O<br />

C<br />

N<br />

W<br />

F

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