Mechanics and Tribology of MEMS Materials - prod.sandia.gov ...
Mechanics and Tribology of MEMS Materials - prod.sandia.gov ...
Mechanics and Tribology of MEMS Materials - prod.sandia.gov ...
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During processing <strong>of</strong> microelectromechanical systems with selective tungsten, operators<br />
observed that the devices behaved as if “sticky” immediately after treatment. Freshly treated<br />
devices were found to exhibit evidence <strong>of</strong> high adhesion, with inability to move under drive<br />
signals that would normally result in motion for alkylsilane coated devices as discussed in the<br />
last chapter. However, over a period <strong>of</strong> days, the devices were observed to begin operating more<br />
easily.<br />
In order to investigate the relationship between time dependent device behavior <strong>and</strong><br />
surface composition, we examined the surfaces <strong>of</strong> treated devices over a period <strong>of</strong> time after<br />
depsition <strong>of</strong> the tungsten. Samples with blanket films <strong>of</strong> polycrystalline silicon that had been<br />
treated with selective tungsten were examine using x-ray photoelectron spectroscopy,<br />
periodically for two weeks after treatment. All the samples were treated at the same time, <strong>and</strong><br />
stored in a desiccator. At each sampling interval, two coupons were removed from the<br />
desiccator <strong>and</strong> examined using XPS as described above. Figure 8.2 shows the atomic<br />
concentration <strong>of</strong> surface constituents as a function <strong>of</strong> time for the tungsten coated polycrystalline<br />
silicon.<br />
Concentration (At. %)<br />
40<br />
35<br />
30<br />
25<br />
20<br />
15<br />
10<br />
5<br />
0<br />
0 2 4 6 8 10 12 14<br />
Time (days)<br />
Fig. 8.2 Composition <strong>of</strong> polycrystalline surfaces treated with selective tungsten as a function <strong>of</strong><br />
time after deposition, while stored in a desiccator.<br />
Figure 8.2 indicates that the surface initially retains some residual fluorine, but is otherwise<br />
relatively clean in terms <strong>of</strong> organic contamination, considering that the surfaces are transferred in<br />
air from the deposition tool to the photoelectron spectrometer. The major species present on the<br />
surfaces after deposition are tungsten, nitrogen <strong>and</strong> oxygen. Over a period <strong>of</strong> about a week, the<br />
surface oxygen concentration increased slowly while the surface adsorbed organic molecules <strong>and</strong><br />
lost fluorine. Figure 8.3 shows the binding energy spectrum <strong>of</strong> W4f, <strong>and</strong> the assigned chemical<br />
configurations responsible for the multiple overlapping peaks in the spectrum. As shown in the<br />
figure, several valencies <strong>of</strong> tungsten are present. Several <strong>of</strong> the peaks may be assigned to more<br />
than one compound. Figure 8.4 shows the changes in tungsten moeties as a function <strong>of</strong> time,<br />
77<br />
O<br />
C<br />
N<br />
W<br />
F