Jahresbericht 2005 - IPHT Jena

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40 Die nachfolgend präsentierten Ergebnisse in diesem <strong>Jahresbericht</strong> machen die hohe Attraktivität der Forschung zu optischen Fasern und Faseranwendungen deutlich und bieten in Kombination mit dem komplementären Arbeitsgebiet zur photonischen Instrumentierung im <strong>IPHT</strong> breite zukünftige Anwendungsmöglichkeiten. 2.2. Scientific Results 2.2.1 Flame hydrolysis technique (FHD) for the preparation of advanced optical materials (C. Aichele, St. Grimm, M. Köhler, K. Schuster) The flame hydrolysis technique allows the production of highest quality silica. This material is primarily used for planar optical waveguide devices and components or for the deposition of substrate tubes by OVD (Outside Vapor Deposition). To utilize the potential of this technology we are engaged in new applications. The recent concentration of microlithography on an excitation wavelength of 193 nm requires an improvement of the optical materials and devices used. For high power density and excellent replication quality, materials are necessary which provide special, very well-defined properties in terms of optical quality as well as type and distribution of the dopant hydrogen. The flame hydrolysis technique enables the preparation of a high-quality quartz glass material combined with the implementation of different dopant distributions in a wide range. Fig. 2.1: FHD-configuration. OPTIK / OPTICS A further miniaturization of the structure at the same excitation wavelength can be achieved by what is known as immersion lithography. Aqueous fluids (immersions) with a still higher refractive index than standard materials and good optical transparency are particularly suitable for these processes. By flame hydrolysis it is possible to prepare highly pure, oxidic particles with a main size of about 5–10 nm and a narrow particle size distribution. These oxidic materials can be used as additives to water to increase its refractive index for application as an immersion medium. Figure 2.1 shows the burner configuration used for the FHD technique. 2.2.2 Materials for fibre lasers: Preparation and properties (S. Unger, A. Schwuchow, S. Grimm, V. Reichel, J. Kirchhof) Recently, the performance of rare earth doped high-power silica fibre lasers has been dramatically increased with output powers beyond 1 kW, high efficiency and excellent beam quality. This progress is due to new design concepts such as non-symmetrical double clads and large mode area core structures, but also by careful tailoring of the material properties. Extreme power load and complicated fibre structures make high demands on preparation technology and materials. However, up to now still little is known about the influence of the material and the preparation technology on the laser efficiency. Here, the absorption and emission properties of silica based ytterbium doped preforms, made by Modified Chemical Vapor Deposition (MCVD) and solution doping, and of the drawn fibres were investigated in dependence on the atmosphere during the preform collapsing. The preparation was carried out under oxidizing and reducing conditions (helium/carbon monoxide/hydrogen). The absorption measurements on preforms and fibres with nominally identical compositions have shown the following results: – All Yb doped preform samples show the typical Yb 3+ absorption in the wavelength region between 800 and 1100 nm, and the absorption coefficient is not remarkably changed by modifications during the preparation process.
Fig. 2.2: Preform absorption spectra in the UV/VIS region. – However, changes are observed in the UV/VIS region. With an increasingly reducing effect of the collapsing atmosphere (He
Page 1 and 2: INSTITUT FÜR PHYSIKALISCHE HOCHTEC
Page 3 and 4: Inhaltsverzeichnis / Content INHALT
Page 5 and 6: A. Vorwort Das IPHT konnte das Jahr
Page 7 and 8: Ein besonderer Höhepunkt war im Ra
Page 9 and 10: ORGANISATION / ORGANIZATION B. Orga
Page 11 and 12: Mitglieder des IPHT e.V. / Members
Page 13 and 14: Finanzen des Instituts / Budget of
Page 15 and 16: MAGNETIK & QUANTENELEKTRONIK / MAGN
Page 29 and 30: • Lawrence Berkely National Labor
Page 35 and 36: J. Bierlich, T. Habisreuther, M. Ze
Page 37 and 38: Dr. R. Mattheis Editorial Board IEE
Page 39 and 40: 2. Optik / Optics 2.1 Übersicht Da
Page 41: Ein wichtiges internationales Forum
Page 45 and 46: OPTIK / OPTICS Coating material NA
Page 47 and 48: 2.2.8 High-reflectivity draw-tower
Page 49 and 50: a b Fig. 2.17: a. Scheme of cross s
Page 51 and 52: 2.2.13 Monitoring of inhomogeneous
Page 53 and 54: The operation principle is based on
Page 55 and 56: K.-F. Klein, H. S. Eckhardt, C. Vin
Page 57 and 58: J. P. Dakin, W. Ecke, M. Reuter:
Page 59 and 60: W. Ecke, K. Schröder: „Anordnung
Page 61 and 62: 3.1 Überblick 2005 war für den Be
Page 63 and 64: MIKROSYSTEME / MICROSYSTEMS Fig. 3D
Page 65 and 66: 3.2 Scientific Results 3.2.1 Spectr
Page 67 and 68: Spectral-reader-technologies (G. Ni
Page 69 and 70: 3.2.2 Photonic chip systems (W. Fri
Page 71 and 72: B. DNA-chip Technology Characteriza
Page 73 and 74: cial flow dynamics inside the micro
Page 75 and 76: • Mikrotechnik + Sensorik GmbH, J
Page 77 and 78: P. Rösch, M. Schmitt, K.-D. Peschk
Page 79 and 80: P. Grigaravicius, K. O. Greulich, S
Page 81 and 82: • Member of scientific council of
Page 83 and 84: LASERTECHNIK / LASER TECHNOLOGY Com
Page 85 and 86: Dank besonderem Engagement aller Mi
Page 87 and 88: UV optical materials (Alfons Burker
Page 89 and 90: • PV Silicon GmbH, Erfurt • Sch
Page 91 and 92: F. Falk „Mikromaterialbearbeitung
Page 93 and 94:
into the Ta 2O 5 layers. Unlike for
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Jahresbericht 2005 - IPHT Jena

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