High & Ultrahigh Vacuum Thin Film Deposition Technology

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e-Vap ®Miniature Evaporation Systemse-Vap ® 3000 System■ Includes water and electrical connections■ Evaporates refractory and dielectric materials■ CE compliantSpecificationsThin Film DepositionMeteringCoolingInput powerVoltage outputOutput RippleDeposition Rate vs Emission CurrentDigital Emission CurrentPower Supply: Air cooledSource: Watercooled225 V ± 25 V, Single-phase, 50/60 Hz, 18 Amperes5 kV DC negative polarityLess than 1% RMSVoltage Regulation .025%Current output0 to 0.6 AmperesEmission Current Regulation 0.25%Efficiency 85%WeightDimensions65lb19" W x 10.5" H x 19" LFeatures■ 3kW Switching technology power supply■ UHV compatible■ 2.75" Del-Seal CF flange mountMDC’s 3kW Electron Beam Source is a versatile and economicaldeposition tool used for thin film coating processes in high and ultrahighvacuum environments. The e-Vap ® 3000 system evaporatesvirtually all rare earth refractory and dielectric materials. It providesresearchers a simple, relatively low-cost means of depositing highpurity thin film coatings. The source is manufactured using all metalsealed gaskets, is extremely compact and has a high level ofruggedness, reliability and efficiency. The compact source designallows the entire source assembly to fit through a 2.75" Del-Seal CF port opening and eliminates internal water and electrical connections.This 3kW source is available free standing or as a completeturnkey system. The filament/emitter assembly has a heat-sink andfeatures a unique single piece high voltage insulator design. Theentire emitter assembly slides out for easy maintenance.A new 3kW Switching Power Supply is available to drive these miniaturesources. State-of-the-art switching technology renders a compactrack mountable power supply. The built-in source controller alsoemploys switching technology and provides extremely accurateThis graph represents stable rates (not maximum rates) @ 3kW with a source to substrate distance of 10 inches. These values are intended as reference only, actual rates may vary.1400Stable Deposition Rate in Å / min120010008006004002000SiOSiO 2HfO 2FeTiPdCoSiNiGeMoTaW0 100 200 300 400 500 600Emission Current in mA12 Phone 800-443-8817 www.mdcvacuum.com MDC Vacuum Products Corporation
e-Vap ®Miniature Evaporation SystemsPower SupplySource AssemblySource Assembly2.75AcrylicHigh-VoltageShield3.757.257.872.75Del-Seal CFFlange• Source can be installed in a portwith 2-3/4" Del-Seal CF flangesSourcefits withina 1.38 insidediameter tubeThin Film DepositionSource DetailFilament Detail2.75Del-Seal CFFlange9.002 ccCrucible.63 Source Face toFlange Center LineVap ® evaporation sources. These liners offer improved thermal stabilitywhile reducing the transfer of heat to the crucible. Liners providethe ability to easily and quickly switch evaporant materialswithout removing the crucible for cleaning. They also reduce powerrequirements to achieve specific evaporation rates. See page 39 fora detailed list of crucible liner materials.1 Includes source and power supplyDESCRIPTIONCOMPLETE SYSTEM 1SOURCE ASSEMBLY3000W POWER SUPPLYFILAMENT SET, 5 ea.ANODEBEAM FORMERBEAM FORMER INSULATORHIGH VOLTAGE INSULATORPOWER SUPPLY SPARE PARTS KITREFERENCEEV-CE-3000EV-SA-3000EV-PS-CE-3000EV-FIL-3000EV-A-3000EV-BF-3000EV-IBF-3000EV-IHV-3000EV-PS-SPK-3000PARTNUMBER992600992601991221992610991929991922990529991921991257-03PRICE$1740059851450060195155712530MDC Vacuum Products Corporation www.mdcvacuum.com Phone 800-443-881713
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High & Ultrahigh Vacuum Thin Film Deposition Technology

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